Issued Patents All Time
Showing 51–68 of 68 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11111415 | Chemical mechanical planarization of films comprising elemental silicon | James M. Henry, Krishna P. Murella, Dnyanesh Chandrakant Tamboli, Joseph D. Rose | 2021-09-07 |
| 11104825 | Metal compound chemically anchored colloidal particles and methods of production and use thereof | Xiaobo Shi, Jo-Ann Theresa Schwartz | 2021-08-31 |
| 11078417 | Low oxide trench dishing chemical mechanical polishing | Xiaobo Shi, Krishna P. Murella, Joseph D. Rose, Mark Leonard O'Neill | 2021-08-03 |
| 11072726 | Low oxide trench dishing chemical mechanical polishing | Xiaobo Shi, Krishna P. Murella, Joseph D. Rose, Mark Leonard O'Neill | 2021-07-27 |
| 11066575 | Chemical mechanical planarization for tungsten-containing substrates | Xiaobo Shi, James Allen Schlueter, Jo-Ann Theresa Schwartz | 2021-07-20 |
| 10894906 | Composite particles, method of refining and use thereof | John Edward Quincy Hughes, Krishna P. Murella, Reinaldo Mario Machado, Mark Leonard O'Neill, Dnyanesh Chandrakant Tamboli | 2021-01-19 |
| 10669449 | Composite abrasive particles for chemical mechanical planarization composition and method of use thereof | Jo-Ann Theresa Schwartz, Malcolm Grief, Xiaobo Shi, Krishna P. Murella, Steven Charles Winchester +5 more | 2020-06-02 |
| 10421890 | Composite particles, method of refining and use thereof | John Edward Quincy Hughes, Krishna P. Murella, Reinaldo Mario Machado, Mark Leonard O'Neill, Dnyanesh Chandrakant Tamboli | 2019-09-24 |
| 10418247 | Composite abrasive particles for chemical mechanical planarization composition and method of use thereof | Krishna P. Murella, Dnyanesh Chandrakant Tamboli | 2019-09-17 |
| 10160884 | Metal compound chemically anchored colloidal particles and methods of production and use thereof | Xiaobo Shi, Jo-Ann Theresa Schwartz | 2018-12-25 |
| 10109493 | Composite abrasive particles for chemical mechanical planarization composition and method of use thereof | Jo-Ann Theresa Schwartz, Malcolm Grief, Xiaobo Shi, Krishna P. Murella, Steven Charles Winchester +5 more | 2018-10-23 |
| 10011741 | Chemical mechanical polishing (CMP) composition for shallow trench isolation (STI) applications and methods of making thereof | Xiaobo Shi, John Edward Quincy Hughes, Daniel Hernandez Castillo, II, Jae-ouk Choo, James Allen Schlueter +6 more | 2018-07-03 |
| 9940294 | Method, apparatus, and system for configuring high-speed serial bus parameter | Shuicai Rao, Jianzhao Li | 2018-04-10 |
| 9305476 | Chemical mechanical polishing (CMP) composition for shallow trench isolation (STI) applications and methods of making thereof | Xiaobo Shi, John Edward Quincy Hughes, Daniel Hernandez Castillo, II, Jae-ouk Choo, James Allen Schlueter +6 more | 2016-04-05 |
| 9062230 | Chemical mechanical polishing (CMP) composition for shallow trench isolation (STI) applications and methods of making thereof | Xiaobo Shi, John Edward Quincy Hughes, Daniel Hernandez Castillo, II, Jae-ouk Choo, James Allen Schlueter +6 more | 2015-06-23 |
| 8859428 | Chemical mechanical polishing (CMP) composition for shallow trench isolation (STI) applications and methods of making thereof | Xiaobo Shi, John Edward Quincy Hughes, Daniel Hernandez Castillo, II, Jae-ouk Choo, James Allen Schlueter +6 more | 2014-10-14 |
| 8808530 | Method and apparatus for electrocatalytic amplification on pre-oxidized measuring electrode | Allen J. Bard, Fu-Ren F. Fan | 2014-08-19 |
| 8318126 | Methods of making metal oxide nanostructures and methods of controlling morphology of same | Stanislaus S. Wong | 2012-11-27 |