KW

Keith Doran Weeks

AI Atomera Incorporated: 26 patents #6 of 20Top 30%
AA Asm America: 12 patents #21 of 181Top 15%
AB Asm Ip Holding B.V.: 3 patents #237 of 620Top 40%
AN Asm International N.V.: 1 patents #116 of 197Top 60%
📍 Chandler, AZ: #88 of 3,331 inventorsTop 3%
🗺 Arizona: #587 of 32,909 inventorsTop 2%
Overall (All Time): #71,318 of 4,157,543Top 2%
42
Patents All Time

Issued Patents All Time

Showing 26–42 of 42 patents

Patent #TitleCo-InventorsDate
10109479 Method of making a semiconductor device with a buried insulating layer formed by annealing a superlattice Robert J. Mears, Robert John Stephenson, Nyles Wynn Cody, Marek Hytha 2018-10-23
9490325 Structures and devices including a tensile-stressed silicon arsenic layer and methods of forming same 2016-11-08
9324811 Structures and devices including a tensile-stressed silicon arsenic layer and methods of forming same 2016-04-26
9312131 Selective epitaxial formation of semiconductive films Matthias Bauer 2016-04-12
9099423 Doped semiconductor films and processing John Tolle, Matthew G. Goodman, Sandeep Mehta 2015-08-04
8278176 Selective epitaxial formation of semiconductor films Matthias Bauer 2012-10-02
8088223 System for control of gas injectors Michael A. Todd, Paul Jacobson 2012-01-03
7964513 Method to form ultra high quality silicon-containing compound layers Michael A. Todd, Christiaan J. Werkhoven, Christophe Pomarede 2011-06-21
7901968 Heteroepitaxial deposition over an oxidized surface Paul Brabant 2011-03-08
7816236 Selective deposition of silicon-containing films Matthias Bauer, Chantal Arena, Ronald Thomas Bertram, JR., Pierre Tomasini, Nyles Wynn Cody +3 more 2010-10-19
7651953 Method to form ultra high quality silicon-containing compound layers Michael A. Todd, Christiaan J. Werkhoven, Christophe Pomarede 2010-01-26
7648690 Methods of making substitutionally carbon-doped crystalline Si-containing materials by chemical vapor deposition Matthias Bauer, Pierre Tomasini, Nyles Wynn Cody 2010-01-19
7438760 Methods of making substitutionally carbon-doped crystalline Si-containing materials by chemical vapor deposition Matthias Bauer, Pierre Tomasini, Nyles Wynn Cody 2008-10-21
7297641 Method to form ultra high quality silicon-containing compound layers Michael A. Todd, Christiaan J. Werkhoven, Christophe Pomarede 2007-11-20
7294582 Low temperature silicon compound deposition Ruben Haverkort, Yuet Wan, Marinus De Blank, Cornelius A. van der Jeugd, Jacobus Johannes Beulens +3 more 2007-11-13
7029995 Methods for depositing amorphous materials and using them as templates for epitaxial films by solid phase epitaxy Michael A. Todd, Paul Brabant, Jianqing Wen 2006-04-18
7005160 Methods for depositing polycrystalline films with engineered grain structures Michael A. Todd 2006-02-28