| 9873942 |
Methods of vapor deposition with multiple vapor sources |
Eric James Shero, Mohith Verghese, Jan Willem Maes, Chang-Gong Wang |
2018-01-23 |
| 9238865 |
Multiple vapor sources for vapor deposition |
Eric James Shero, Mohith Verghese, Jan Willem Maes, Chang-Gong Wang |
2016-01-19 |
| 7964513 |
Method to form ultra high quality silicon-containing compound layers |
Michael A. Todd, Keith Doran Weeks, Christiaan J. Werkhoven |
2011-06-21 |
| 7790556 |
Integration of high k gate dielectric |
Michael Eugene Givens, Eric James Shero, Michael A. Todd |
2010-09-07 |
| 7651953 |
Method to form ultra high quality silicon-containing compound layers |
Michael A. Todd, Keith Doran Weeks, Christiaan J. Werkhoven |
2010-01-26 |
| 7629270 |
Remote plasma activated nitridation |
Johan Swerts, Hilde De Witte, Jan Willem Maes, Ruben Haverkort, Yuet Wan +3 more |
2009-12-08 |
| 7569284 |
Incorporation of nitrogen into high k dielectric film |
Eric James Shero |
2009-08-04 |
| 7476627 |
Surface preparation prior to deposition |
Jeff Roberts, Eric James Shero |
2009-01-13 |
| 7405453 |
Incorporation of nitrogen into high k dielectric film |
Eric James Shero |
2008-07-29 |
| 7297641 |
Method to form ultra high quality silicon-containing compound layers |
Michael A. Todd, Keith Doran Weeks, Christiaan J. Werkhoven |
2007-11-20 |
| 7294582 |
Low temperature silicon compound deposition |
Ruben Haverkort, Yuet Wan, Marinus De Blank, Cornelius A. van der Jeugd, Jacobus Johannes Beulens +3 more |
2007-11-13 |
| 7056835 |
Surface preparation prior to deposition |
Jeff Roberts, Eric James Shero |
2006-06-06 |
| 7026219 |
Integration of high k gate dielectric |
Michael Eugene Givens, Eric James Shero, Michael A. Todd |
2006-04-11 |
| 7022613 |
Reduced cross-contamination between chambers in a semiconductor processing tool |
Eric James Shero, Olli Jylhä |
2006-04-04 |
| 6960537 |
Incorporation of nitrogen into high k dielectric film |
Eric James Shero |
2005-11-01 |
| 6958277 |
Surface preparation prior to deposition |
Jeff Roberts, Eric James Shero |
2005-10-25 |
| 6825051 |
Plasma etch resistant coating and process |
Fred AmRhein |
2004-11-30 |
| 6806145 |
Low temperature method of forming a gate stack with a high k layer deposited over an interfacial oxide layer |
Suvi Haukka, Eric James Shero, Jan Willem Hub Maes, Marko Tuominen |
2004-10-19 |
| 6797617 |
Reduced cross-contamination between chambers in a semiconductor processing tool |
Eric James Shero, Olli Jylhä |
2004-09-28 |
| 6613695 |
Surface preparation prior to deposition |
Jeff Roberts, Eric James Shero |
2003-09-02 |