Issued Patents All Time
Showing 26–36 of 36 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7429532 | Semiconductor substrate process using an optically writable carbon-containing mask | Kartik Ramaswamy, Hiroji Hanawa, Biagio Gallo, Kenneth S. Collins, Kai Ma +4 more | 2008-09-30 |
| 7422775 | Process for low temperature plasma deposition of an optical absorption layer and high speed optical annealing | Kartik Ramaswamy, Hiroji Hanawa, Biagio Gallo, Kenneth S. Collins, Kai Ma +4 more | 2008-09-09 |
| 7422988 | Rapid detection of imminent failure in laser thermal processing of a substrate | Bruce E. Adams, Dean Jennings, Aaron Muir Hunter, Abhilash J. Mayur | 2008-09-09 |
| 7335611 | Copper conductor annealing process employing high speed optical annealing with a low temperature-deposited optical absorber layer | Kartik Ramaswamy, Hiroji Hanawa, Biagio Gallo, Kenneth S. Collins, Kai Ma +4 more | 2008-02-26 |
| 7323401 | Semiconductor substrate process using a low temperature deposited carbon-containing hard mask | Kartik Ramaswamy, Hiroji Hanawa, Biagio Gallo, Kenneth S. Collins, Kai Ma +4 more | 2008-01-29 |
| 7312148 | Copper barrier reflow process employing high speed optical annealing | Kartik Ramaswamy, Hiroji Hanawa, Biagio Gallo, Kenneth S. Collins, Kai Ma +4 more | 2007-12-25 |
| 7312162 | Low temperature plasma deposition process for carbon layer deposition | Kartik Ramaswamy, Hiroji Hanawa, Biagio Gallo, Kenneth S. Collins, Kai Ma +4 more | 2007-12-25 |
| 7279721 | Dual wavelength thermal flux laser anneal | Dean Jennings, Haifan Liang, Mark Yam, Abhilash J. Mayur, Aaron Muir Hunter +2 more | 2007-10-09 |
| 7135392 | Thermal flux laser annealing for ion implantation of semiconductor P-N junctions | Bruce E. Adams, Dean Jennings, Abhilash J. Mayur, Joseph M. Ranish | 2006-11-14 |
| 7129440 | Single axis light pipe for homogenizing slow axis of illumination systems based on laser diodes | Bruce E. Adams, Dean Jennings, Abhilash J. Mayur, Joseph M. Ranish | 2006-10-31 |
| 7109098 | Semiconductor junction formation process including low temperature plasma deposition of an optical absorption layer and high speed optical annealing | Kartik Ramaswamy, Hiroji Hanawa, Biagio Gallo, Kenneth S. Collins, Kai Ma +4 more | 2006-09-19 |