RM

Rashid Mavliev

Applied Materials: 31 patents #353 of 7,310Top 5%
AL American Air Liquide: 1 patents #181 of 326Top 60%
NE Nevmet: 1 patents #6 of 10Top 60%
PS Particle Measuring Systems: 1 patents #41 of 64Top 65%
📍 Campbell, CA: #106 of 2,187 inventorsTop 5%
🗺 California: #10,935 of 386,348 inventorsTop 3%
Overall (All Time): #75,904 of 4,157,543Top 2%
41
Patents All Time

Issued Patents All Time

Showing 26–41 of 41 patents

Patent #TitleCo-InventorsDate
7137879 Conductive polishing article for electrochemical mechanical polishing Liang-Yuh Chen, Yuchun Wang, Yan Wang, Alain Duboust, Daniel Carl +4 more 2006-11-21
7125477 Contacts for electrochemical processing Paul D. Butterfield, Liang-Yuh Chen, Yongqi Hu, Antoine P. Manens, Stan Tsai 2006-10-24
7104869 Barrier removal at low polish pressure Stan Tsai, Lizhong Sun, Feng Q. Liu, Liang-Yuh Chen, Ratson Morad 2006-09-12
7066800 Conductive polishing article for electrochemical mechanical polishing Liang-Yuh Chen, Yuchun Wang, Yan Wang, Alain Duboust, Daniel Carl +4 more 2006-06-27
7060606 Method and apparatus for chemical mechanical polishing of semiconductor substrates Stan Tsai, Liang-Yuh Chen, Lizhong Sun, Shijian Li, Feng Q. Liu +2 more 2006-06-13
6991526 Control of removal profile in electrochemically assisted CMP Lizhong Sun, Liang-Yuh Chen, Siew Neo, Feng Q. Liu, Alain Duboust +1 more 2006-01-31
6988942 Conductive polishing article for electrochemical mechanical polishing Liang-Yuh Chen, Yuchun Wang, Yan Wang, Alain Duboust, Daniel Carl +4 more 2006-01-24
6979248 Conductive polishing article for electrochemical mechanical polishing Yongqi Hu, Yan Wang, Alain Duboust, Feng Q. Liu, Liang-Yuh Chen +2 more 2005-12-27
6962524 Conductive polishing article for electrochemical mechanical polishing Paul D. Butterfield, Liang-Yuh Chen, Yonqi Hu, Antoine P. Manens, Stan Tsai +5 more 2005-11-08
6955516 Single wafer dryer and drying methods Younes Achkire, Alexander Lerner, Boris Govzman, Boris Fishkin, Michael Sugarman +4 more 2005-10-18
6869498 Chemical mechanical polishing with shear force measurement Stan Tsai, Liang-Yuh Chen 2005-03-22
6821881 Method for chemical mechanical polishing of semiconductor substrates Stan Tsai, Liang-Yuh Chen, Lizhong Sun, Shijian Li, Feng Q. Liu +2 more 2004-11-23
6710874 Method and apparatus for detecting individual particles in a flowable sample 2004-03-23
6573836 Method and apparatus for detecting the presence of powdered material in envelopes Norm Gitis, Alex Meyman, Oleg Shulepov 2003-06-03
6392745 Method and apparatus for the fast detection of surface characteristics Hwa-Chi Wang 2002-05-21
5903338 Condensation nucleus counter using mixing and cooling Craig Parsons 1999-05-11