Issued Patents All Time
Showing 26–36 of 36 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7704352 | High-aspect ratio anode and apparatus for high-speed electroplating on a solar cell substrate | Sergey Lopatin, Nicolay Kovarsky, John O. Dukovic, Charles Gay | 2010-04-27 |
| 7674662 | Process for making thin film field effect transistors using zinc oxide | Yan Ye, John M. White | 2010-03-09 |
| 7659203 | Electroless deposition process on a silicon contact | Michael P. Stewart, Timothy Weidman, Arulkumar Shanmugasundram | 2010-02-09 |
| 7585769 | Parasitic particle suppression in growth of III-V nitride films using MOCVD and HVPE | David P. Bour, Jacob Smith, Sandeep Nijhawan, Lori D. Washington | 2009-09-08 |
| 7575982 | Stacked-substrate processes for production of nitride semiconductor structures | David P. Bour, Sandeep Nijhawan, Lori D. Washington, Jacob Smith | 2009-08-18 |
| 7547570 | Method for forming thin film photovoltaic interconnects using self-aligned process | Peter G. Borden | 2009-06-16 |
| 7470599 | Dual-side epitaxy processes for production of nitride semiconductor structures | Sandeep Nijhawan, Lori D. Washington, David P. Bour, Jacob Smith | 2008-12-30 |
| 6136672 | Process for device fabrication using a high-energy boron implant | Konstantin Bourdelle | 2000-10-24 |
| 6043139 | Process for controlling dopant diffusion in a semiconductor layer | Hans-Joachim L. Gossmann, John M. Poate, Peter Stolk | 2000-03-28 |
| 5731626 | Process for controlling dopant diffusion in a semiconductor layer and semiconductor layer formed thereby | Hans-Joachim L. Gossmann, John M. Poate, Peter Stolk | 1998-03-24 |
| 5169798 | Forming a semiconductor layer using molecular beam epitaxy | Hans-Joachim L. Gossmann | 1992-12-08 |