Issued Patents All Time
Showing 201–213 of 213 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8753985 | Molecular layer deposition of silicon carbide | Brian Saxton Underwood, Nitin K. Ingle | 2014-06-17 |
| 8580699 | Embedded catalyst for atomic layer deposition of silicon oxide | — | 2013-11-12 |
| 8466073 | Capping layer for reduced outgassing | Linlin Wang, Nitin K. Ingle | 2013-06-18 |
| 8465903 | Radiation patternable CVD film | Timothy Weidman, Timothy Michaelson, Paul Deaton, Nitin K. Ingle, Amit Chatterjee | 2013-06-18 |
| 8304351 | In-situ ozone cure for radical-component CVD | Linlin Wang, Nitin K. Ingle, Shankar Venkataraman | 2012-11-06 |
| 8242031 | High quality silicon oxide films by remote plasma CVD from disilane precursors | Srinivas D. Nemani, Ellie Yieh | 2012-08-14 |
| 8211808 | Silicon-selective dry etch for carbon-containing films | Kedar Sapre, Jing Tang, Linlin Wang, Nitin K. Ingle | 2012-07-03 |
| 7943531 | Methods for forming a silicon oxide layer over a substrate | Srinivas D. Nemani, Ellie Yieh | 2011-05-17 |
| 7867923 | High quality silicon oxide films by remote plasma CVD from disilane precursors | Srinivas D. Nemani, Ellie Yieh | 2011-01-11 |
| 7825044 | Curing methods for silicon dioxide multi-layers | Srinivas D. Nemani, Timothy Weidman | 2010-11-02 |
| 7745352 | Curing methods for silicon dioxide thin films deposited from alkoxysilane precursor with harp II process | Srinivas D. Nemani, Timothy Weidman | 2010-06-29 |
| 7541297 | Method and system for improving dielectric film quality for void free gap fill | Jeffrey C. Munro, Linlin Wang, Srinivas D. Nemani, Yi Zheng, Zheng Yuan +2 more | 2009-06-02 |
| 7498273 | Formation of high quality dielectric films of silicon dioxide for STI: usage of different siloxane-based precursors for harp II—remote plasma enhanced deposition processes | Jeffrey C. Munro, Srinivas D. Nemani | 2009-03-03 |