Issued Patents 2025
Showing 1–12 of 12 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12426342 | Low germanium, high boron silicon rich capping layer for PMOS contact resistance thermal stability | Debaleena Nandi, Cory Bomberger, Anand S. Murthy, Mauro J. Kobrinsky, Rushabh SHAH +6 more | 2025-09-23 |
| 12414339 | Formation of gate spacers for strained PMOS gate-all-around transistor structures | Ashish Agrawal, Siddharth Chouksey, Jack T. Kavalieros, Cheng-Ying Huang | 2025-09-09 |
| 12388011 | Top gate recessed channel CMOS thin film transistor and methods of fabrication | Ryan Keech, Cory Bomberger, Cheng-Ying Huang, Ashish Agrawal, Willy Rachmady +1 more | 2025-08-12 |
| 12376362 | Field effect transistors with a gated oxide semiconductor source/drain spacer | Rafael Rios, Van H. Le, Jack T. Kavalieros | 2025-07-29 |
| 12369399 | Gate-to-gate isolation for stacked transistor architecture via selective dielectric deposition structure | Willy Rachmady, Sudipto Naskar, Cheng-Ying Huang, Marko Radosavljevic, Nicole K. Thomas +2 more | 2025-07-22 |
| 12349416 | Transistor structures with a metal oxide contact buffer and a method of fabricating the transistor structures | Abhishek A. Sharma, Van H. Le, Jack T. Kavalieros, Shriram Shivaraman, Seung Hoon Sung +4 more | 2025-07-01 |
| 12342574 | Contact resistance reduction in transistor devices with metallization on both sides | Koustav Ganguly, Ryan Keech, Subrina RAFIQUE, Glenn A. Glass, Anand S. Murthy +2 more | 2025-06-24 |
| 12328927 | Low resistance and reduced reactivity approaches for fabricating contacts and the resulting structures | Nazila Haratipour, Siddharth Chouksey, Arnab Sen Gupta, Christopher J. Jezewski, I-Cheng Tung +2 more | 2025-06-10 |
| 12288803 | Transistor with isolation below source and drain | Willy Rachmady, Cheng-Ying Huang, Matthew V. Metz, Nicholas G. Minutillo, Sean T. Ma +3 more | 2025-04-29 |
| 12255137 | Sideways vias in isolation areas to contact interior layers in stacked devices | Ehren Mannebach, Aaron D. Lilak, Hui Jae Yoo, Patrick Morrow, Anh Phan +3 more | 2025-03-18 |
| 12224202 | Forming an oxide volume within a fin | Cheng-Ying Huang, Jack T. Kavalieros, Aaron D. Lilak, Ehren Mannebach, Patrick Morrow +3 more | 2025-02-11 |
| 12191395 | Dual gate control for trench shaped thin film transistors | Abhishek A. Sharma, Van H. Le, Jack T. Kavalieros, Shriram Shivaraman, Benjamin Chu-Kung +2 more | 2025-01-07 |