Issued Patents 2024
Showing 1–14 of 14 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12170215 | Systems and methods for correction of impact of wafer tilt on misregistration measurements | Vladimir Levinski, Daria Negri | 2024-12-17 |
| 12165930 | Adaptive modeling misregistration measurement system and method | Vladimir Levinski, Daria Negri, Nireekshan K. Reddy | 2024-12-10 |
| 12131959 | Systems and methods for improved metrology for semiconductor device wafers | Liran Yerushalmi, Daria Negri, Ohad Bachar, Yossi Simon, Nir Ben David +2 more | 2024-10-29 |
| 12111580 | Optical metrology utilizing short-wave infrared wavelengths | Isaac Salib, Raviv Yohanan, Diana Shaphirov, Eitan Hajaj, Vladimir Levinski +7 more | 2024-10-08 |
| 12092966 | Device feature specific edge placement error (EPE) | Nadav Gutman, Frank Laske, Andrei V. Shchegrov | 2024-09-17 |
| 12078601 | Universal metrology model | Nireekshan K. Reddy, Vladimir Levinski | 2024-09-03 |
| 12066322 | Single grab overlay measurement of tall targets | Andrew V. Hill, Yonatan Vaknin, Avner Safrani | 2024-08-20 |
| 12032300 | Imaging overlay with mutually coherent oblique illumination | Andrew V. Hill, Vladimir Levinski, Daria Negri, Yonatan Vaknin | 2024-07-09 |
| 12001148 | Enhancing performance of overlay metrology | Andrew V. Hill, Yonatan Vaknin, Yossi Simon, Daria Negri, Vladimir Levinski +9 more | 2024-06-04 |
| 11967535 | On-product overlay targets | Vladimir Levinski, Ido Dolev, Yoram Uziel | 2024-04-23 |
| 11933717 | Sensitive optical metrology in scanning and static modes | Andrew V. Hill, Yoram Uziel, Yossi Simon, Gilad Laredo | 2024-03-19 |
| 11921825 | System and method for determining target feature focus in image-based overlay metrology | Etay Lavert, Yossi Simon, Dimitry Sanko, Avner Safrani | 2024-03-05 |
| 11899375 | Massive overlay metrology sampling with multiple measurement columns | Jonathan M. Madsen, Andrei V. Shchegrov, Andrew V. Hill, Yossi Simon, Gilad Laredo +1 more | 2024-02-13 |
| 11880141 | Method of measuring misregistration in the manufacture of topographic semiconductor device wafers | Daria Negri, Gilad Laredo | 2024-01-23 |