Issued Patents 2024
Showing 1–17 of 17 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12142467 | Self-assembled monolayer deposition from low vapor pressure organic molecules | Qiwei Liang, Keith Tatseun Wong, Antony K. Jan | 2024-11-12 |
| 12085858 | Photoresist patterning process | Huixiong Dai, Steven Hiloong WELCH, Mangesh Ashok BANGAR, Ellie Yieh | 2024-09-10 |
| 12057329 | Selective etch using material modification and RF pulsing | Bhargav S. Citla, Chentsau Ying, Viachslav Babayan, Michael W. Stowell | 2024-08-06 |
| 12054827 | Flowable film curing using H2 plasma | Shishi Jiang, Pramit Manna, Abhijit Basu Mallick, Suresh Chand Seth | 2024-08-06 |
| 12020982 | Metal based hydrogen barrier | Srinivas Gandikota, Steven C. H. Hung, Yixiong Yang, Susmit Singha Roy, Nikolaos Bekiaris | 2024-06-25 |
| 11993842 | Selective deposition of metal oxide by pulsed chemical vapor deposition | Keith Tatseun Wong, Andrew C. Kummel, James P. Huang, Yunil Cho | 2024-05-28 |
| 11993845 | High selectivity atomic layer deposition process | Jong Hun Choi, Christopher Ahles, Andrew C. Kummel, Keith Tatseun Wong | 2024-05-28 |
| 11972943 | Methods and apparatus for depositing dielectric material | Bhargav S. Citla, Jethro Tannos, Joshua Rubnitz | 2024-04-30 |
| 11955333 | Methods and apparatus for processing a substrate | Jethro Tannos, Bhargav S. Citla, Ellie Yieh, Joshua Rubnitz, Erica Chen +3 more | 2024-04-09 |
| 11948828 | Pin-less substrate transfer apparatus and method for a processing chamber | Sultan Malik, Adib Khan, Qiwei Liang | 2024-04-02 |
| 11934103 | Apparatus for post exposure bake of photoresist | Douglas A. Buchberger, Jr., Dmitry Lubomirsky, John O. Dukovic | 2024-03-19 |
| 11914299 | Lithography process window enhancement for photoresist patterning | Huixiong Dai, Mangesh Ashok BANGAR, Christopher S. Ngai, Ellie Yieh | 2024-02-27 |
| 11899366 | Method and apparatus for post exposure processing of photoresist wafers | Viachslav Babayan, Douglas A. Buchberger, Jr., Qiwei Liang, Ludovic Godet, Daniel J. Woodruff +2 more | 2024-02-13 |
| 11901222 | Multi-step process for flowable gap-fill film | Maximillian Clemons, Nikolaos Bekiaris | 2024-02-13 |
| 11880137 | Film structure for electric field guided photoresist patterning process | Huixiong Dai, Mangesh Ashok BANGAR, Ellie Yieh, Steven Hiloong WELCH, Christopher S. Ngai | 2024-01-23 |
| 11881411 | High pressure annealing process for metal containing materials | Kaushal K. Singh, Mei-Yee Shek, Ellie Yieh | 2024-01-23 |
| 11862458 | Directional selective deposition | Bhargav S. Citla, Soham Asrani, Joshua Rubnitz, Ellie Yieh | 2024-01-02 |