Issued Patents 2024
Showing 1–5 of 5 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12181801 | Chamber and methods of treating a substrate after exposure to radiation | Dmitry Lubomirsky, Qiwei Liang, Hyunjun Kim, Ellie Yieh | 2024-12-31 |
| 12112972 | Rotating biasable pedestal and electrostatic chuck in semiconductor process chamber | Qiwei Liang, Gautam Pisharody, Dmitry Lubomirsky, Shekhar ATHANI | 2024-10-08 |
| 11955333 | Methods and apparatus for processing a substrate | Jethro Tannos, Bhargav S. Citla, Srinivas D. Nemani, Ellie Yieh, Joshua Rubnitz +3 more | 2024-04-09 |
| 11934103 | Apparatus for post exposure bake of photoresist | Dmitry Lubomirsky, John O. Dukovic, Srinivas D. Nemani | 2024-03-19 |
| 11899366 | Method and apparatus for post exposure processing of photoresist wafers | Viachslav Babayan, Qiwei Liang, Ludovic Godet, Srinivas D. Nemani, Daniel J. Woodruff +2 more | 2024-02-13 |