Issued Patents 2024
Showing 1–10 of 10 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12181801 | Chamber and methods of treating a substrate after exposure to radiation | Douglas A. Buchberger, Jr., Qiwei Liang, Hyunjun Kim, Ellie Yieh | 2024-12-31 |
| 12146219 | Flow control features of CVD chambers | Kien N. Chuc, Qiwei Liang, Hanh Nguyen, Xinglong Chen, Matthew L. Miller +5 more | 2024-11-19 |
| 12125680 | Ion extraction assembly having variable electrode thickness for beam uniformity control | Alexandre Likhanskii, Alan V. Hayes | 2024-10-22 |
| 12112972 | Rotating biasable pedestal and electrostatic chuck in semiconductor process chamber | Qiwei Liang, Douglas A. Buchberger, Jr., Gautam Pisharody, Shekhar ATHANI | 2024-10-08 |
| 12009228 | Low temperature chuck for plasma processing systems | Toan Q. Tran, Zilu Weng, Satoru Kobayashi, Tae Seung Cho, Soonam Park +2 more | 2024-06-11 |
| 11972930 | Cylindrical cavity with impedance shifting by irises in a power-supplying waveguide | Satoru Kobayashi, Hideo Sugai, Toan Q. Tran, Soonam Park | 2024-04-30 |
| 11934103 | Apparatus for post exposure bake of photoresist | Douglas A. Buchberger, Jr., John O. Dukovic, Srinivas D. Nemani | 2024-03-19 |
| 11915950 | Multi-zone semiconductor substrate supports | Mehmet Tugrul Samir, Dongqing Yang, Peter M. Hillman, Soonam Park, Martin Yue Choy +1 more | 2024-02-27 |
| 11915911 | Two piece electrode assembly with gap for plasma control | Tien Fak Tan, Saravjeet Singh, Tae Wan Kim, Kenneth D. Schatz, Tae Seung Cho +1 more | 2024-02-27 |
| 11901161 | Methods and apparatus for symmetrical hollow cathode electrode and discharge mode for remote plasma processes | Tae Seung Cho, Saravana Kumar Natarajan, Kenneth D. Schatz, Samartha Subramanya | 2024-02-13 |