BA

Brent A. Anderson

IBM: 13 patents #46 of 5,109Top 1%
Samsung: 1 patents #7,344 of 17,120Top 45%
📍 Jericho, VT: #2 of 17 inventorsTop 15%
🗺 Vermont: #6 of 407 inventorsTop 2%
Overall (2024): #5,195 of 561,600Top 1%
14
Patents 2024

Issued Patents 2024

Showing 1–14 of 14 patents

Patent #TitleCo-InventorsDate
12142525 Self-aligning spacer tight pitch via Lawrence A. Clevenger, Nicholas Anthony Lanzillo 2024-11-12
12136655 Backside electrical contacts to buried power rails Ruilong Xie, Albert M. Young, Kangguo Cheng, Julien Frougier, Balasubramanian Pranatharthiharan +2 more 2024-11-05
RE50181 Isolation region fabrication for replacement gate processing Edward J. Nowak 2024-10-22
12057371 Semiconductor device with early buried power rail (BPR) and backside power distribution network (BSPDN) Ruilong Xie, Balasubramanian Pranatharthiharan, Mukta G. Farooq 2024-08-06
12040250 Heat pipe for vertically stacked field effect transistors Terence B. Hook, Anthony I. Chou 2024-07-16
12034005 Self-aligned metal gate with poly silicide for vertical transport field-effect transistors Ruqiang Bao, Dechao Guo, Vijay Narayanan 2024-07-09
12002874 Buried power rail contact Junli Wang, Ruilong Xie, Chen Zhang, Heng Wu 2024-06-04
12001772 Ultra-short-height standard cell architecture Albert M. Chu, Junli Wang 2024-06-04
11990410 Top via interconnect having a line with a reduced bottom dimension Lawrence A. Clevenger, Nicholas Anthony Lanzillo, Christopher J. Penny, Kisik Choi, Robert R. Robison 2024-05-21
11961759 Interconnects having spacers for improved top via critical dimension and overlay tolerance Lawrence A. Clevenger, Nicholas Anthony Lanzillo, Christopher J. Penny, Kisik Choi, Robert R. Robison 2024-04-16
11915966 Backside power rail integration Ruilong Xie, Takeshi Nogami, Roy R. Yu, Balasubramanian Pranatharthiharan, Albert M. Young +1 more 2024-02-27
11901440 Sacrificial fin for self-aligned contact rail formation Yann Mignot, Christopher J. Waskiewicz, Su Chen Fan, Junli Wang 2024-02-13
11894265 Top via with damascene line and via Lawrence A. Clevenger, Kisik Choi, Nicholas Anthony Lanzillo, Christopher J. Penny, Robert R. Robison 2024-02-06
11869808 Top via process with damascene metal Lawrence A. Clevenger, Nicholas Anthony Lanzillo, Christopher J. Penny, Kisik Choi, Robert R. Robison 2024-01-09