| 12176348 |
Self-aligned hybrid substrate stacked gate-all-around transistors |
Ruqiang Bao, Junli Wang |
2024-12-24 |
| 12176250 |
Metal gate boundary for transistor scaling |
Ruqiang Bao |
2024-12-24 |
| 12148833 |
Three-dimensional, monolithically stacked field effect transistors formed on the front and backside of a wafer |
Sung-Dae Suk, Somnath Ghosh, Chen Zhang, Junli Wang, Devendra K. Sadana |
2024-11-19 |
| 12142656 |
Staggered stacked semiconductor devices |
Albert M. Chu, Junli Wang, Albert M. Young, Vidhi Zalani |
2024-11-12 |
| 12107168 |
Independent gate length tunability for stacked transistors |
Ruqiang Bao, Junli Wang |
2024-10-01 |
| 12087691 |
Semiconductor structures with backside gate contacts |
Ruilong Xie, Julien Frougier, Veeraraghavan S. Basker, Lawrence A. Clevenger, Nicolas Loubet +3 more |
2024-09-10 |
| 12034005 |
Self-aligned metal gate with poly silicide for vertical transport field-effect transistors |
Brent A. Anderson, Ruqiang Bao, Vijay Narayanan |
2024-07-09 |
| 11984401 |
Stacked FET integration with BSPDN |
Ruilong Xie, Junli Wang, Mukta G. Farooq |
2024-05-14 |
| 11908743 |
Planar devices with consistent base dielectric |
Huimei Zhou, Andrew M. Greene, Julien Frougier, Ruqiang Bao, Jingyun Zhang +1 more |
2024-02-20 |
| 11895818 |
Stacked FET SRAM |
Ruilong Xie, Carl Radens, Junli Wang, Ravikumar Ramachandran, Julien Frougier |
2024-02-06 |
| 11894462 |
Forming a sacrificial liner for dual channel devices |
Huiming Bu, Kangguo Cheng, Sivananda K. Kanakasabapathy, Peng Xu |
2024-02-06 |
| 11894423 |
Contact resistance reduction in nanosheet device structure |
Heng Wu, Ruqiang Bao, Junli Wang, Lan Yu, Reinaldo Vega +1 more |
2024-02-06 |
| 11869893 |
Stacked field effect transistor with wrap-around contacts |
Ruilong Xie, Chun-Chen Yeh, Alexander Reznicek |
2024-01-09 |
