Issued Patents 2022
Showing 1–19 of 19 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11531262 | Mask blanks and methods for depositing layers on mask blank | Pei-Cheng Hsu, Ta-Cheng Lien, Wen-Chang Hsueh | 2022-12-20 |
| 11506971 | Pellicle and method of using the same | Chue-San Yoo, Pei-Cheng Hsu, Yun-Yue Lin | 2022-11-22 |
| 11506969 | EUV photo masks and manufacturing method thereof | Pei-Cheng Hsu, Ta-Cheng Lien | 2022-11-22 |
| 11448956 | EUV mask | Ching-Huang Chen, Chi-Yuan Sun, Hua-Tai Lin, Ming-Wei Chen | 2022-09-20 |
| 11442356 | Lithography mask with an amorphous capping layer | Pei-Cheng Hsu, Chih-Tao Chien, Ming-Wei Chen, Ta-Cheng Lien | 2022-09-13 |
| 11435660 | Photomask and method of fabricating a photomask | Ping-Hsun Lin, Yen-Cheng HO, Chih-Cheng Lin, Chia-Jen Chen | 2022-09-06 |
| 11430671 | Ozone wafer cleaning module having an ultraviolet lamp module with rotatable reflectors | Chen-Yang Lin, Chung-Hsuan Liu, Ku-Hsiang Sung, Kuan-Wen Lin, Chia-Jen Chen | 2022-08-30 |
| 11422466 | Photomask including fiducial mark and method of making semiconductor device using the photomask | Ping-Hsun Lin, Chih-Cheng Lin, Chia-Jen Chen | 2022-08-23 |
| 11385538 | Cleaning method for photo masks and apparatus therefor | Pei-Cheng Hsu, Hao-Ping Cheng, Ta-Cheng Lien | 2022-07-12 |
| 11360384 | Method of fabricating and servicing a photomask | Chun-Fu Yang, Pei-Cheng Hsu, Ta-Cheng Lien | 2022-06-14 |
| 11327405 | Method of manufacturing photo masks | Chien-Cheng Chen, Chia-Jen Chen, Shih-Ming Chang, Tran-Hui Shen, Yen-Cheng HO +1 more | 2022-05-10 |
| 11294292 | Particle removing assembly and method of cleaning mask for lithography | Chen-Yang Lin, Da-Wei Yu, Li-Hsin Wang, Kuan-Wen Lin, Chia-Jen Chen | 2022-04-05 |
| 11294274 | Pellicle assembly and method for advanced lithography | Amo Chen, Yun-Yue Lin, Ta-Cheng Lien, Chih-Cheng Lin, Jeng-Horng Chen | 2022-04-05 |
| 11294271 | Mask for extreme ultraviolet photolithography | Wen-Chang Hsueh, Ta-Cheng Lien | 2022-04-05 |
| 11287754 | Mask blank for lithography and method of manufacturing the same | Ming-Wei Chen, Ping-Hsun Lin | 2022-03-29 |
| 11249384 | Mask for EUV lithography and method of manufacturing the same | Pei-Cheng Hsu, Chi-Ping Wen, Tzu Yi Wang, Ta-Cheng Lien | 2022-02-15 |
| 11237477 | Reticle container | Pei-Cheng Hsu, Ta-Cheng Lien, Tzu Yi Wang | 2022-02-01 |
| 11221554 | EUV masks to prevent carbon contamination | Pei-Cheng Hsu, Ta-Cheng Lien | 2022-01-11 |
| 11215918 | Method of critical dimension control by oxygen and nitrogen plasma treatment in EUV mask | Pei-Cheng Hsu, Chun-Fu Yang, Ta-Cheng Lien | 2022-01-04 |