Issued Patents 2022
Showing 1–11 of 11 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11531262 | Mask blanks and methods for depositing layers on mask blank | Hsin-Chang Lee, Ta-Cheng Lien, Wen-Chang Hsueh | 2022-12-20 |
| 11506971 | Pellicle and method of using the same | Chue-San Yoo, Hsin-Chang Lee, Yun-Yue Lin | 2022-11-22 |
| 11506969 | EUV photo masks and manufacturing method thereof | Ta-Cheng Lien, Hsin-Chang Lee | 2022-11-22 |
| 11442356 | Lithography mask with an amorphous capping layer | Hsin-Chang Lee, Chih-Tao Chien, Ming-Wei Chen, Ta-Cheng Lien | 2022-09-13 |
| 11385538 | Cleaning method for photo masks and apparatus therefor | Hsin-Chang Lee, Hao-Ping Cheng, Ta-Cheng Lien | 2022-07-12 |
| 11360384 | Method of fabricating and servicing a photomask | Chun-Fu Yang, Ta-Cheng Lien, Hsin-Chang Lee | 2022-06-14 |
| 11249384 | Mask for EUV lithography and method of manufacturing the same | Chi-Ping Wen, Tzu Yi Wang, Ta-Cheng Lien, Hsin-Chang Lee | 2022-02-15 |
| 11243461 | Reflective mask and fabricating method thereof | Tsiao-Chen Wu | 2022-02-08 |
| 11237477 | Reticle container | Ta-Cheng Lien, Tzu Yi Wang, Hsin-Chang Lee | 2022-02-01 |
| 11221554 | EUV masks to prevent carbon contamination | Ta-Cheng Lien, Hsin-Chang Lee | 2022-01-11 |
| 11215918 | Method of critical dimension control by oxygen and nitrogen plasma treatment in EUV mask | Chun-Fu Yang, Ta-Cheng Lien, Hsin-Chang Lee | 2022-01-04 |