Issued Patents 2022
Showing 1–11 of 11 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11531262 | Mask blanks and methods for depositing layers on mask blank | Hsin-Chang Lee, Pei-Cheng Hsu, Wen-Chang Hsueh | 2022-12-20 |
| 11506969 | EUV photo masks and manufacturing method thereof | Pei-Cheng Hsu, Hsin-Chang Lee | 2022-11-22 |
| 11442356 | Lithography mask with an amorphous capping layer | Hsin-Chang Lee, Pei-Cheng Hsu, Chih-Tao Chien, Ming-Wei Chen | 2022-09-13 |
| 11385538 | Cleaning method for photo masks and apparatus therefor | Hsin-Chang Lee, Pei-Cheng Hsu, Hao-Ping Cheng | 2022-07-12 |
| 11360384 | Method of fabricating and servicing a photomask | Chun-Fu Yang, Pei-Cheng Hsu, Hsin-Chang Lee | 2022-06-14 |
| 11294274 | Pellicle assembly and method for advanced lithography | Amo Chen, Yun-Yue Lin, Hsin-Chang Lee, Chih-Cheng Lin, Jeng-Horng Chen | 2022-04-05 |
| 11294271 | Mask for extreme ultraviolet photolithography | Wen-Chang Hsueh, Hsin-Chang Lee | 2022-04-05 |
| 11249384 | Mask for EUV lithography and method of manufacturing the same | Pei-Cheng Hsu, Chi-Ping Wen, Tzu Yi Wang, Hsin-Chang Lee | 2022-02-15 |
| 11237477 | Reticle container | Pei-Cheng Hsu, Tzu Yi Wang, Hsin-Chang Lee | 2022-02-01 |
| 11221554 | EUV masks to prevent carbon contamination | Pei-Cheng Hsu, Hsin-Chang Lee | 2022-01-11 |
| 11215918 | Method of critical dimension control by oxygen and nitrogen plasma treatment in EUV mask | Pei-Cheng Hsu, Chun-Fu Yang, Hsin-Chang Lee | 2022-01-04 |