RH

Richard Johannes Franciscus Van Haren

AB Asml Netherlands B.V.: 9 patents #5 of 680Top 1%
📍 Waalre, NL: #2 of 47 inventorsTop 5%
Overall (2022): #9,564 of 548,613Top 2%
9
Patents 2022

Issued Patents 2022

Showing 1–9 of 9 patents

Patent #TitleCo-InventorsDate
11493851 Lithographic method and lithographic apparatus Hakki Ergün Cekli, Xing Lan Liu, Stefan Cornelis Theodorus Van Der Sanden 2022-11-08
11428521 Metrology method, target and substrate Kaustuve Bhattacharyya, Henricus Wilhelmus Maria Van Buel, Christophe David Fouquet, Hendrik Jan Hidde Smilde, Maurits Van Der Schaar +7 more 2022-08-30
11385550 Methods and apparatus for obtaining diagnostic information relating to an industrial process Alexander Ypma, Jasper Menger, David Deckers, David Han, Adrianus Cornelis Matheus Koopman +3 more 2022-07-12
11320750 Determining an optimal operational parameter setting of a metrology system Leon Paul VAN DIJK, Victor Emanuel Calado, Xing Lan Liu 2022-05-03
11300889 Metrology apparatus Leon Paul VAN DIJK, Subodh Singh, Ilya MALAKHOVSKY, Ronald Henricus Johannes OTTEN, Amandev Singh 2022-04-12
11300887 Method to change an etch parameter Victor Emanuel Calado, Leon Paul VAN DIJK, Roy Werkman, Everhardus Cornelis Mos, Jochem Sebastiaan Wildenberg +4 more 2022-04-12
11300888 Methods of determining stress in a substrate, control system for controlling a lithographic process, lithographic apparatus and computer program product Leon Paul VAN DIJK, Ilya MALAKHOVSKY, Ronald Henricus Johannes OTTEN 2022-04-12
11294294 Alignment mark positioning in a lithographic process Leon Paul VAN DIJK, Orion Jonathan Pierre Mouraille, Anne Marie Pastol 2022-04-05
11226567 Methods and apparatus for use in a device manufacturing method Leon Paul VAN DIJK, Ilya MALAKHOVSKY, Ronald Henricus Johannes OTTEN, Mahdi SADEGHINIA 2022-01-18