LD

Leon Paul VAN DIJK

AB Asml Netherlands B.V.: 6 patents #13 of 680Top 2%
Overall (2022): #21,449 of 548,613Top 4%
6
Patents 2022

Issued Patents 2022

Showing 1–6 of 6 patents

Patent #TitleCo-InventorsDate
11320750 Determining an optimal operational parameter setting of a metrology system Victor Emanuel Calado, Xing Lan Liu, Richard Johannes Franciscus Van Haren 2022-05-03
11300887 Method to change an etch parameter Richard Johannes Franciscus Van Haren, Victor Emanuel Calado, Roy Werkman, Everhardus Cornelis Mos, Jochem Sebastiaan Wildenberg +4 more 2022-04-12
11300888 Methods of determining stress in a substrate, control system for controlling a lithographic process, lithographic apparatus and computer program product Richard Johannes Franciscus Van Haren, Ilya MALAKHOVSKY, Ronald Henricus Johannes OTTEN 2022-04-12
11300889 Metrology apparatus Richard Johannes Franciscus Van Haren, Subodh Singh, Ilya MALAKHOVSKY, Ronald Henricus Johannes OTTEN, Amandev Singh 2022-04-12
11294294 Alignment mark positioning in a lithographic process Richard Johannes Franciscus Van Haren, Orion Jonathan Pierre Mouraille, Anne Marie Pastol 2022-04-05
11226567 Methods and apparatus for use in a device manufacturing method Richard Johannes Franciscus Van Haren, Ilya MALAKHOVSKY, Ronald Henricus Johannes OTTEN, Mahdi SADEGHINIA 2022-01-18