Issued Patents 2022
Showing 1–2 of 2 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11320750 | Determining an optimal operational parameter setting of a metrology system | Leon Paul VAN DIJK, Xing Lan Liu, Richard Johannes Franciscus Van Haren | 2022-05-03 |
| 11300887 | Method to change an etch parameter | Richard Johannes Franciscus Van Haren, Leon Paul VAN DIJK, Roy Werkman, Everhardus Cornelis Mos, Jochem Sebastiaan Wildenberg +4 more | 2022-04-12 |