Issued Patents 2022
Showing 1–7 of 7 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11466980 | Metrology method and apparatus, lithographic system, device manufacturing method and substrate | Maurits Van Der Schaar, Hendrik Jan Hidde Smilde | 2022-10-11 |
| 11428521 | Metrology method, target and substrate | Henricus Wilhelmus Maria Van Buel, Christophe David Fouquet, Hendrik Jan Hidde Smilde, Maurits Van Der Schaar, Arie Jeffrey Den Boef +7 more | 2022-08-30 |
| 11422476 | Methods and apparatus for monitoring a lithographic manufacturing process | Emil Peter Schmitt-Weaver, Wim Tjibbo Tel, Frank Staals, Leon Martin Levasier | 2022-08-23 |
| 11385553 | Metrology method, patterning device, apparatus and computer program | Zili Zhou, Nitesh Pandey, Olger Victor Zwier, Patrick Warnaar, Maurits Van Der Schaar +6 more | 2022-07-12 |
| 11385552 | Method of measuring a structure, inspection apparatus, lithographic system and device manufacturing method | Martin Jacobus Johan Jak | 2022-07-12 |
| 11300883 | Method to determine a patterning process parameter | Martin Jacobus Johan Jak, Simon Gijsbert Josephus Mathijssen, Won-Jae Jang, Jinmoo Byun | 2022-04-12 |
| 11249404 | System and method for measurement of alignment | Emil Peter Schmitt-Weaver, Rene Marinus Gerardus Johan Queens, Wolfgang Henke, Wim Tjibbo Tel, Theodorus Franciscus Adrianus Maria Linschoten | 2022-02-15 |