Issued Patents 2022
Showing 1–5 of 5 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11526085 | Metrology method and apparatus, substrate, lithographic system and device manufacturing method | Hendrik Jan Hidde Smilde, Bastiaan Onne Fagginger Auer, Davit Harutyunyan | 2022-12-13 |
| 11513442 | Method of determining control parameters of a device manufacturing process | Wim Tjibbo Tel, Mark John Maslow, Koenraad VAN INGEN SCHENAU, Abraham SLACHTER, Roy ANUNCIADO +3 more | 2022-11-29 |
| 11429029 | Method and apparatus for illumination adjustment | Maurits Van Der Schaar, Youping Zhang, Arie Jeffrey Den Boef, Feng Xiao, Martin Ebert | 2022-08-30 |
| 11415900 | Metrology system and method for determining a characteristic of one or more structures on a substrate | Patricius Aloysius Jacobus Tinnemans, Arie Jeffrey Den Boef, Armand Eugene Albert Koolen, Nitesh Pandey, Vasco Tomas Tenner +1 more | 2022-08-16 |
| 11385553 | Metrology method, patterning device, apparatus and computer program | Zili Zhou, Nitesh Pandey, Olger Victor Zwier, Maurits Van Der Schaar, Elliott Gerard McNamara +6 more | 2022-07-12 |