| 11209729 |
Vacuum-integrated hardmask processes and apparatus |
Jeffrey Marks, George Andrew Antonelli, Richard A. Gottscho, Dennis M. Hausmann, Thomas Knisley +3 more |
2021-12-28 |
| 11180850 |
Dynamic precursor dosing for atomic layer deposition |
Purushottam Kumar, Jun Qian, Hu Kang, Ishtak Karim, Fung Suong Ou |
2021-11-23 |
| 11133180 |
Gapfill of variable aspect ratio features with a composite PEALD and PECVD method |
Hu Kang, Shankar Swaminathan, Jun Qian, Wanki Kim, Dennis M. Hausmann +1 more |
2021-09-28 |
| 11127567 |
Systems and methods for suppressing parasitic plasma and reducing within-wafer non-uniformity |
Hu Kang, Shankar Swaminathan, Jun Qian, Chloe Baldasseroni, Frank L. Pasquale +8 more |
2021-09-21 |
| 11101129 |
Ultrathin atomic layer deposition film accuracy thickness control |
Jun Qian, Hu Kang, Seiji Matsuyama, Purushottam Kumar |
2021-08-24 |
| 11078570 |
Azimuthal critical dimension non-uniformity for double patterning process |
Pulkit Agarwal, Frank L. Pasquale, Ravi Kumar |
2021-08-03 |
| 11072860 |
Fill on demand ampoule refill |
Tuan Nguyen, Eashwar Ranganathan, Shankar Swaminathan, Chloe Baldasseroni, Ramesh Chandrasekharan +2 more |
2021-07-27 |
| 11021792 |
Symmetric precursor delivery |
Eli Jeon, Purushottam Kumar, Jeffrey Kersten, Gautam Dhar |
2021-06-01 |
| 11011379 |
Capped ALD films for doping fin-shaped channel regions of 3-D IC transistors |
Reza Arghavani, Samantha Tan, Bhadri N. Varadarajan, Ananda Banerji, Jun Qian +1 more |
2021-05-18 |
| 10978302 |
Method of improving deposition induced CD imbalance using spatially selective ashing of carbon based film |
Ishtak Karim, Pulkit Agarwal, Joseph R. Abel, Purushottam Kumar |
2021-04-13 |
