| 11180850 |
Dynamic precursor dosing for atomic layer deposition |
Purushottam Kumar, Adrien LaVoie, Hu Kang, Ishtak Karim, Fung Suong Ou |
2021-11-23 |
| 11133180 |
Gapfill of variable aspect ratio features with a composite PEALD and PECVD method |
Hu Kang, Shankar Swaminathan, Wanki Kim, Dennis M. Hausmann, Bart J. van Schravendijk +1 more |
2021-09-28 |
| 11127567 |
Systems and methods for suppressing parasitic plasma and reducing within-wafer non-uniformity |
Hu Kang, Adrien LaVoie, Shankar Swaminathan, Chloe Baldasseroni, Frank L. Pasquale +8 more |
2021-09-21 |
| 11119412 |
Exposure equipment and exposure method |
Sihong Zhai |
2021-09-14 |
| 11101129 |
Ultrathin atomic layer deposition film accuracy thickness control |
Hu Kang, Adrien LaVoie, Seiji Matsuyama, Purushottam Kumar |
2021-08-24 |
| 11011379 |
Capped ALD films for doping fin-shaped channel regions of 3-D IC transistors |
Reza Arghavani, Samantha Tan, Bhadri N. Varadarajan, Adrien LaVoie, Ananda Banerji +1 more |
2021-05-18 |
