Issued Patents 2021
Showing 1–6 of 6 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11180850 | Dynamic precursor dosing for atomic layer deposition | Purushottam Kumar, Adrien LaVoie, Hu Kang, Ishtak Karim, Fung Suong Ou | 2021-11-23 |
| 11133180 | Gapfill of variable aspect ratio features with a composite PEALD and PECVD method | Hu Kang, Shankar Swaminathan, Wanki Kim, Dennis M. Hausmann, Bart J. van Schravendijk +1 more | 2021-09-28 |
| 11127567 | Systems and methods for suppressing parasitic plasma and reducing within-wafer non-uniformity | Hu Kang, Adrien LaVoie, Shankar Swaminathan, Chloe Baldasseroni, Frank L. Pasquale +8 more | 2021-09-21 |
| 11119412 | Exposure equipment and exposure method | Sihong Zhai | 2021-09-14 |
| 11101129 | Ultrathin atomic layer deposition film accuracy thickness control | Hu Kang, Adrien LaVoie, Seiji Matsuyama, Purushottam Kumar | 2021-08-24 |
| 11011379 | Capped ALD films for doping fin-shaped channel regions of 3-D IC transistors | Reza Arghavani, Samantha Tan, Bhadri N. Varadarajan, Adrien LaVoie, Ananda Banerji +1 more | 2021-05-18 |