Issued Patents 2021
Showing 1–8 of 8 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| D937329 | Sputter target for a physical vapor deposition chamber | Martin Lee Riker, William Fruchterman, Ilya Lavitsky, Srinivasa Rao YEDLA | 2021-11-30 |
| 11189472 | Cathode assembly having a dual position magnetron and centrally fed coolant | Irena H. Wysok, Anthony Chih-Tung Chan, Jiao Song, Prashant Prabhakar Prabhu | 2021-11-30 |
| D933726 | Deposition ring for a semiconductor processing chamber | Jiao Song, David Gunther, Irena H. Wysok, Anthony Chih-Tung Chan | 2021-10-19 |
| 11114288 | Physical vapor deposition apparatus | Junqi Wei, Yueh Sheng Ow, Wen Long Favier Shoo | 2021-09-07 |
| 11049701 | Biased cover ring for a substrate processing system | Adolph Miller Allen, William Johanson, Viachslav Babayan, Zhong Qiang Hua, Carl Johnson +4 more | 2021-06-29 |
| 11024490 | Magnetron having enhanced target cooling configuration | Vanessa Faune, William Johanson | 2021-06-01 |
| 10998209 | Substrate processing platforms including multiple processing chambers | Thomas Brezoczky, Srinivasa Rao YEDLA | 2021-05-04 |
| D908645 | Sputtering target for a physical vapor deposition chamber | David Gunther, Siew Kit Hoi | 2021-01-26 |