| D937329 |
Sputter target for a physical vapor deposition chamber |
Martin Lee Riker, William Fruchterman, Ilya Lavitsky, Srinivasa Rao YEDLA |
2021-11-30 |
| 11189472 |
Cathode assembly having a dual position magnetron and centrally fed coolant |
Irena H. Wysok, Anthony Chih-Tung Chan, Jiao Song, Prashant Prabhakar Prabhu |
2021-11-30 |
| D933726 |
Deposition ring for a semiconductor processing chamber |
Jiao Song, David Gunther, Irena H. Wysok, Anthony Chih-Tung Chan |
2021-10-19 |
| 11114288 |
Physical vapor deposition apparatus |
Junqi Wei, Yueh Sheng Ow, Wen Long Favier Shoo |
2021-09-07 |
| 11049701 |
Biased cover ring for a substrate processing system |
Adolph Miller Allen, William Johanson, Viachslav Babayan, Zhong Qiang Hua, Carl Johnson +4 more |
2021-06-29 |
| 11024490 |
Magnetron having enhanced target cooling configuration |
Vanessa Faune, William Johanson |
2021-06-01 |
| 10998209 |
Substrate processing platforms including multiple processing chambers |
Thomas Brezoczky, Srinivasa Rao YEDLA |
2021-05-04 |
| D908645 |
Sputtering target for a physical vapor deposition chamber |
David Gunther, Siew Kit Hoi |
2021-01-26 |
