Issued Patents 2020
Showing 26–40 of 40 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10691023 | Method for performing lithography process with post treatment | Ming-Hui Weng, Chin-Hsiang Lin | 2020-06-23 |
| 10684545 | Method for forming semiconductor structure by patterning assist layer having polymer | An-Ren Zi, Chin-Hsiang Lin | 2020-06-16 |
| 10672619 | Material composition and methods thereof | Siao-Shan Wang, Cheng-Han Wu, Chin-Hsiang Lin | 2020-06-02 |
| 10672610 | Grafting design for pattern post-treatment in semiconductor manufacturing | Siao-Shan Wang, Chin-Hsiang Lin | 2020-06-02 |
| 10655019 | Priming material for substrate coating | Ya-Ling Cheng | 2020-05-19 |
| 10658191 | Conformal middle layer for a lithography process | Chen-Yu Liu, Ming-Huei Weng | 2020-05-19 |
| 10658184 | Pattern fidelity enhancement with directional patterning technology | Yu-Tien Shen, Chi-Cheng Hung, Chin-Hsiang Lin, Chien-Wei Wang, Chih-Yuan Ting +7 more | 2020-05-19 |
| 10655210 | Roll-to-roll sputtering process with hybrid target and product thereof | Chien-Fa Liao | 2020-05-19 |
| 10649339 | Resist material and method for forming semiconductor structure using resist layer | Ya-Ching Chang, Chen-Yu Liu, Cheng-Han Wu, Chin-Hsiang Lin | 2020-05-12 |
| 10635000 | Semiconductor method of protecting wafer from bevel contamination | An-Ren Zi, Joy Cheng, Chin-Hsiang Lin | 2020-04-28 |
| 10622211 | Metal-compound-removing solvent and method in lithography | An-Ren Zi, Joy Cheng | 2020-04-14 |
| 10573519 | Method for performing a photolithography process | Tsung-Han Ko, Joy Cheng, Chin-Hsiang Lin | 2020-02-25 |
| 10539878 | Lithography patterning technique | Lilin Chang | 2020-01-21 |
| 10529552 | Method for manufacturing a semiconductor device and a coating material | Yu Ling Chien, Chien-Chih Chen, Chin-Hsiang Lin, Yahru Cheng | 2020-01-07 |
| 10527941 | Extreme ultraviolet photoresist and method | Chen-Yu Liu, Ya-Ching Chang, Cheng-Han Wu, Chin-Hsiang Lin | 2020-01-07 |