Issued Patents 2020
Showing 1–14 of 14 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10791617 | Method of controlling ion energy distribution using a pulse generator with a current-return output stage | Leonid Dorf, Olivier Luere, James Rogers, Sunil Srinivasan, Anurag Kumar Mishra | 2020-09-29 |
| 10784089 | Temperature and bias control of edge ring | James Rogers, Linying Cui | 2020-09-22 |
| 10745805 | Plasma resistant coating of porous body by atomic layer deposition | Vahid Firouzdor, Sumanth Banda, Daniel Sang Byun, Dana Marie Lovell | 2020-08-18 |
| 10727058 | Methods for forming and etching structures for patterning processes | Vinay Shankar Vidyarthi | 2020-07-28 |
| 10720314 | Confinement ring for use in a plasma processing system | Akira Koshiishi, Alexei Marakhatanov | 2020-07-21 |
| 10685807 | Creating ion energy distribution functions (IEDF) | Leonid Dorf, Travis Koh, Olivier Luere, Olivier Joubert, Philip Allan Kraus +1 more | 2020-06-16 |
| 10636625 | System for coordinating pressure pulses and RF modulation in a small volume confined process reactor | Harmeet Singh | 2020-04-28 |
| 10622190 | Systems and methods for controlling a plasma edge region | Alexei Marakhtanov | 2020-04-14 |
| 10622195 | Multi zone gas injection upper electrode system | Ryan Bise, Alexei Marakhtanov, Lumin Li, Sang Ki Nam, Jim Rogers +6 more | 2020-04-14 |
| 10593516 | Multi-radiofrequency impedance control for plasma uniformity tuning | Alexei Marakhtanov | 2020-03-17 |
| 10586686 | Peripheral RF feed and symmetric RF return for symmetric RF delivery | Sang Ki Nam, James Rogers | 2020-03-10 |
| 10553399 | Pulsed plasma chamber in dual chamber configuration | Alexei Marakhtanov, Eric A. Hudson, Andrew D. Bailey, III | 2020-02-04 |
| 10555412 | Method of controlling ion energy distribution using a pulse generator with a current-return output stage | Leonid Dorf, Olivier Luere, James Rogers, Sunil Srinivasan, Anurag Kumar Mishra | 2020-02-04 |
| 10553404 | Adjustable extended electrode for edge uniformity control | Olivier Luere, Leonid Dorf, Sunil Srinivasan, James Rogers, Denis M. Koosau | 2020-02-04 |