Issued Patents 2020
Showing 1–8 of 8 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10861708 | Three or more states for achieving high aspect ratio dielectric etch | Takumi Yanagawa, Nikhil Dole, Ranadeep Bhowmick, Eric A. Hudson, Felix Kozakevich +2 more | 2020-12-08 |
| 10825656 | Systems and methods for controlling directionality of ions in an edge region by using an electrode within a coupling ring | Michael C. Kellogg, John Holland, Zhigang Chen, Felix Kozakevich, Kenneth Lucchesi | 2020-11-03 |
| 10755895 | Ion energy control by RF pulse shape | Zhigang Chen, John Holland | 2020-08-25 |
| 10622195 | Multi zone gas injection upper electrode system | Ryan Bise, Rajinder Dhindsa, Lumin Li, Sang Ki Nam, Jim Rogers +6 more | 2020-04-14 |
| 10622190 | Systems and methods for controlling a plasma edge region | Rajinder Dhindsa | 2020-04-14 |
| 10615003 | Systems and methods for controlling directionality of ions in an edge region by using an electrode within a coupling ring | Michael C. Kellogg, John Holland, Zhigang Chen, Felix Kozakevich, Kenneth Lucchesi | 2020-04-07 |
| 10593516 | Multi-radiofrequency impedance control for plasma uniformity tuning | Rajinder Dhindsa | 2020-03-17 |
| 10553399 | Pulsed plasma chamber in dual chamber configuration | Rajinder Dhindsa, Eric A. Hudson, Andrew D. Bailey, III | 2020-02-04 |