Issued Patents 2020
Showing 1–8 of 8 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10825680 | Directional deposition on patterned structures | Alexander Kabansky, Jeffrey Marks, Yang Pan | 2020-11-03 |
| 10763083 | High energy atomic layer etching | Wenbing Yang, Tamal Mukherjee, Keren Jacobs Kanarik, Yang Pan | 2020-09-01 |
| 10749103 | Dry plasma etch method to pattern MRAM stack | Taeseung Kim, Wenbing Yang, Jeffrey Marks, Thorsten Lill | 2020-08-18 |
| 10741405 | Selective self-aligned patterning of silicon germanium, germanium and type III/V materials using a sulfur-containing mask | Daniel Peter, Reza Arghavani, Yang Pan | 2020-08-11 |
| 10727073 | Atomic layer etching 3D structures: Si and SiGe and Ge smoothness on horizontal and vertical surfaces | Wenbing Yang, Keren Jacobs Kanarik, Thorsten Lill, Yang Pan | 2020-07-28 |
| 10685836 | Etching substrates using ALE and selective deposition | Jengyi Yu, Richard Wise, Nader Shamma, Yang Pan | 2020-06-16 |
| 10559468 | Capped ALD films for doping fin-shaped channel regions of 3-D IC transistors | Reza Arghavani, Bhadri N. Varadarajan, Adrien LaVoie, Ananda Banerji, Jun Qian +1 more | 2020-02-11 |
| 10546748 | Tin oxide films in semiconductor device manufacturing | Jengyi Yu, Yu Jiang, Hui-Jung Wu, Richard Wise, Yang Pan +2 more | 2020-01-28 |