Issued Patents 2019
Showing 1–10 of 10 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10510515 | Processing tool with electrically switched electrode assembly | Kenneth S. Collins, Kartik Ramaswamy, Shahid Rauf, Kallol Bera, Michael R. Rice +1 more | 2019-12-17 |
| 10475626 | Ion-ion plasma atomic layer etch process and reactor | Kenneth S. Collins, Kartik Ramaswamy, Shahid Rauf, Leonid Dorf, Yang Yang | 2019-11-12 |
| 10453656 | Symmetric plasma process chamber | Hamid Tavassoli, Ajit Balakrishna, Zhigang Chen, Andrew Nguyen, Douglas A. Buchberger, Jr. +3 more | 2019-10-22 |
| 10418225 | Distributed electrode array for plasma processing | Kenneth S. Collins, Michael R. Rice, Kartik Ramaswamy, Yue Guo, Olga Regelman | 2019-09-17 |
| 10373807 | Distributed electrode array for plasma processing | Kenneth S. Collins, Michael R. Rice, Kartik Ramaswamy, Yue Guo, Olga Regelman | 2019-08-06 |
| 10312056 | Distributed electrode array for plasma processing | Kenneth S. Collins, Michael R. Rice, Kartik Ramaswamy, Yue Guo, Olga Regelman | 2019-06-04 |
| 10249495 | Diamond like carbon layer formed by an electron beam plasma process | Yang Yang, Lucy Chen, Jie Zhou, Kartik Ramaswamy, Kenneth S. Collins +5 more | 2019-04-02 |
| 10249470 | Symmetrical inductively coupled plasma source with coaxial RF feed and coaxial shielding | Jason A. Kenney, Kenneth S. Collins, Richard Fovell, Kartik Ramaswamy, Shahid Rauf | 2019-04-02 |
| 10242847 | Plasma processing apparatus and liner assembly for tuning electrical skews | Zhigang Chen, Shahid Rauf, Kenneth S. Collins | 2019-03-26 |
| 10170279 | Multiple coil inductively coupled plasma source with offset frequencies and double-walled shielding | Jason A. Kenney, Kenneth S. Collins, Richard Fovell, Kartik Ramaswamy, Shahid Rauf | 2019-01-01 |