| 10522636 |
Fin field-effect transistor for input/output device integrated with nanosheet field-effect transistor |
Chun Wing Yeung, Chen Zhang, Peng Xu, Kangguo Cheng |
2019-12-31 |
| 10510892 |
Forming a sacrificial liner for dual channel devices |
Kangguo Cheng, Dechao Guo, Sivananda K. Kanakasabapathy, Peng Xu |
2019-12-17 |
| 10504889 |
Integrating a junction field effect transistor into a vertical field effect transistor |
Brent A. Anderson, Terence B. Hook, Xuefeng Liu, Junli Wang |
2019-12-10 |
| 10453922 |
Conformal doping for punch through stopper in fin field effect transistor devices |
Sivananda K. Kanakasabapathy, Fee Li Lie, Tenko Yamashita |
2019-10-22 |
| 10418462 |
Silicidation of bottom source/drain sheet using pinch-off sacrificial spacer process |
Brent A. Anderson, Terence B. Hook, Fee Li Lie, Junli Wang |
2019-09-17 |
| 10347759 |
Vertical FET structure |
Brent A. Anderson, Fee Li Lie, Edward J. Nowak, Junli Wang |
2019-07-09 |
| 10319852 |
Forming eDRAM unit cell with VFET and via capacitance |
Brent A. Anderson, Xuefeng Liu, Junli Wang |
2019-06-11 |
| 10312370 |
Forming a sacrificial liner for dual channel devices |
Kangguo Cheng, Dechao Guo, Sivananda K. Kanakasabapathy, Peng Xu |
2019-06-04 |
| 10297667 |
Fin field-effect transistor for input/output device integrated with nanosheet field-effect transistor |
Chun Wing Yeung, Chen Zhang, Peng Xu, Kangguo Cheng |
2019-05-21 |
| 10297506 |
HDP fill with reduced void formation and spacer damage |
Andrew M. Greene, Balasubramanian Pranatharthiharan, Ruilong Xie |
2019-05-21 |
| 10276558 |
Electrostatic discharge protection using vertical fin CMOS technology |
Brent A. Anderson, Terence B. Hook, Xuefeng Liu, Junli Wang, Miaomiao Wang |
2019-04-30 |
| 10249754 |
Precise junction placement in vertical semiconductor devices using etch stop layers |
Liying Jiang, Siyuranga O. Koswatta, Junli Wang |
2019-04-02 |
| 10229905 |
Electrostatic discharge devices and methods of manufacture |
Junjun Li, Theodorus E. Standaert, Tenko Yamashita |
2019-03-12 |
| 10229983 |
Methods and structures for forming field-effect transistors (FETs) with low-k spacers |
Kangguo Cheng, Peng Xu |
2019-03-12 |
| 10224429 |
Precise junction placement in vertical semiconductor devices using etch stop layers |
Liying Jiang, Siyuranga O. Koswatta, Junli Wang |
2019-03-05 |
| 10211316 |
Silicidation of bottom source/drain sheet using pinch-off sacrificial spacer process |
Brent A. Anderson, Terence B. Hook, Fee Li Lie, Junli Wang |
2019-02-19 |
