Issued Patents 2018
Showing 1–9 of 9 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10113229 | Techniques for controlling ion/neutral ratio of a plasma source | Tsung-Liang Chen, Shurong Liang, Joseph C. Olson | 2018-10-30 |
| 10109498 | Composite patterning mask using angled ion beam deposition | — | 2018-10-23 |
| 10008384 | Techniques to engineer nanoscale patterned features using ions | Simon Ruffell, Adam Brand, Huixiong Dai | 2018-06-26 |
| 10002764 | Sputter etch material selectivity | Kevin Anglin, Tristan Y. Ma, Morgan Evans, Heyun Yin | 2018-06-19 |
| 9997351 | Apparatus and techniques for filling a cavity using angled ion beam | Tsung-Liang Chen, Shurong Liang | 2018-06-12 |
| 9984889 | Techniques for manipulating patterned features using ions | Simon Ruffell, Huixiong Dai, Jun Lang | 2018-05-29 |
| 9934981 | Techniques for processing substrates using directional reactive ion etching | Steven R. Sherman, Simon Ruffell, Adam Brand | 2018-04-03 |
| 9929015 | High efficiency apparatus and method for depositing a layer on a three dimensional structure | Thomas R. Omstead, Simon Ruffell, Tristan Y. Ma, Ethan A. Wright | 2018-03-27 |
| 9885957 | Ion-assisted deposition and implantation of photoresist to improve line edge roughness | Maureen Petterson, Tristan Y. Ma | 2018-02-06 |