| 10121856 |
Integration methods to fabricate internal spacers for nanowire devices |
Seiyon Kim, Tahir Ghani, Anand S. Murthy, Mark Armstrong, Rafael Rios +2 more |
2018-11-06 |
| 10121861 |
Nanowire transistor fabrication with hardmask layers |
Seung Hoon Sung, Seiyon Kim, Willy Rachmady, Jack T. Kavalieros |
2018-11-06 |
| 10115822 |
Methods of forming low band gap source and drain structures in microelectronic devices |
Rafael Rios, Roza Kotlyar |
2018-10-30 |
| 10109711 |
CMOS FinFET device having strained SiGe fins and a strained Si cladding layer on the NMOS channel |
Stephen M. Cea, Roza Kotlyar, Harold W. Kennel, Anand S. Murthy, Glenn A. Glass +1 more |
2018-10-23 |
| 10074573 |
CMOS nanowire structure |
Seiyon Kim, Tahir Ghani, Anand S. Murthy, Annalisa Cappellani, Stephen M. Cea +2 more |
2018-09-11 |
| 10074357 |
Integrated acoustic phase array |
Sasikanth Manipatruni, Debendra Mallik, John C. Johnson |
2018-09-11 |
| 10026829 |
Semiconductor device with isolated body portion |
Annalisa Cappellani, Stephen M. Cea, Tahir Ghani, Harry Gomez, Jack T. Kavalieros +5 more |
2018-07-17 |
| 9978636 |
Isolated and bulk semiconductor devices formed on a same bulk substrate |
Annalisa Cappellani, Rafael Rios, Harry Gomez |
2018-05-22 |
| 9947805 |
Nanowire-based mechanical switching device |
Chytra Pawashe, Kevin Lin, Anurag Chaudhry, Raseong Kim, Seiyon Kim +3 more |
2018-04-17 |
| 9935205 |
Internal spacers for nanowire transistors and method of fabrication thereof |
Seiyon Kim, Daniel A. Simon, Nadia M. Rahhal-Orabi, Chul-Hyun Lim |
2018-04-03 |
| 9935107 |
CMOS FinFET device with dual strained cladding layers on relaxed SiGe fins, and method of fabricating the same |
Stephen M. Cea, Roza Kotlyar, Harold W. Kennel, Tahir Ghani |
2018-04-03 |
| 9926193 |
Magnetic nanomechanical devices for stiction compensation |
Jorge Munoz, Dmitri E. Nikonov, Patrick Theofanis, Chytra Pawashe, Kevin Lin +1 more |
2018-03-27 |
| 9911835 |
Tunneling field effect transistors (TFETs) for CMOS architectures and approaches to fabricating N-type and P-type TFETs |
Roza Kotlyar, Stephen M. Cea, Gilbert Dewey, Benjamin Chu-Kung, Uygar E. Avci +4 more |
2018-03-06 |
| 9893167 |
Integration methods to fabricate internal spacers for nanowire devices |
Seiyon Kim, Daniel A. Simon, Curtis W. Ward |
2018-02-13 |
| 9882053 |
Molded dielectric fin-based nanostructure |
Seiyon Kim |
2018-01-30 |
| 9859368 |
Integration methods to fabricate internal spacers for nanowire devices |
Seiyon Kim, Tahir Ghani, Anand S. Murthy, Mark Armstrong, Rafael Rios +2 more |
2018-01-02 |