Issued Patents 2017
Showing 1–14 of 14 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9837319 | Asymmetric high-K dielectric for reducing gate induced drain leakage | Anthony I. Chou, Arvind Kumar, Chung-Hsun Lin, Claude Ortolland, Jonathan T. Shaw | 2017-12-05 |
| 9812396 | Interconnect structure for semiconductor devices with multiple power rails and redundancy | Jason E. Stephens, Guillaume Bouche, Patrick R. Justison, Byoung Youp Kim, Craig Child | 2017-11-07 |
| 9812324 | Methods to control fin tip placement | Lei Zhuang, Lars Liebmann, Stuart A. Sieg, Fee Li Lie, Mahender Kumar +3 more | 2017-11-07 |
| 9786545 | Method of forming ANA regions in an integrated circuit | Guillaume Bouche, Jason E. Stephens, Byoung Youp Kim, Craig Child | 2017-10-10 |
| 9768071 | Asymmetric high-K dielectric for reducing gate induced drain leakage | Anthony I. Chou, Arvind Kumar, Chung-Hsun Lin, Claude Ortolland, Jonathan T. Shaw | 2017-09-19 |
| 9768195 | Semiconductor structure with integrated passive structures | Anthony I. Chou, Arvind Kumar, Renee T. Mo | 2017-09-19 |
| 9721843 | Asymmetric high-k dielectric for reducing gate induced drain leakage | Anthony I. Chou, Arvind Kumar, Chung-Hsun Lin, Claude Ortolland, Jonathan T. Shaw | 2017-08-01 |
| 9698159 | Semiconductor structure with integrated passive structures | Anthony I. Chou, Arvind Kumar, Renee T. Mo | 2017-07-04 |
| 9685379 | Asymmetric high-k dielectric for reducing gate induced drain leakage | Anthony I. Chou, Arvind Kumar, Chung-Hsun Lin, Claude Ortolland, Jonathan T. Shaw | 2017-06-20 |
| 9659961 | Semiconductor structure with integrated passive structures | Anthony I. Chou, Arvind Kumar, Renee T. Mo | 2017-05-23 |
| 9577061 | Asymmetric high-K dielectric for reducing gate induced drain leakage | Anthony I. Chou, Arvind Kumar, Chung-Hsun Lin, Claude Ortolland, Jonathan T. Shaw | 2017-02-21 |
| 9570354 | Asymmetric high-K dielectric for reducing gate induced drain leakage | Anthony I. Chou, Arvind Kumar, Chung-Hsun Lin, Claude Ortolland, Jonathan T. Shaw | 2017-02-14 |
| 9559010 | Asymmetric high-k dielectric for reducing gate induced drain leakage | Anthony I. Chou, Arvind Kumar, Chung-Hsun Lin, Claude Ortolland, Jonathan T. Shaw | 2017-01-31 |
| 9543213 | Asymmetric high-k dielectric for reducing gate induced drain leakage | Anthony I. Chou, Arvind Kumar, Chung-Hsun Lin, Claude Ortolland, Jonathan T. Shaw | 2017-01-10 |