| 9837319 |
Asymmetric high-K dielectric for reducing gate induced drain leakage |
Arvind Kumar, Chung-Hsun Lin, Shreesh Narasimha, Claude Ortolland, Jonathan T. Shaw |
2017-12-05 |
| 9768195 |
Semiconductor structure with integrated passive structures |
Arvind Kumar, Renee T. Mo, Shreesh Narasimha |
2017-09-19 |
| 9768071 |
Asymmetric high-K dielectric for reducing gate induced drain leakage |
Arvind Kumar, Chung-Hsun Lin, Shreesh Narasimha, Claude Ortolland, Jonathan T. Shaw |
2017-09-19 |
| 9721843 |
Asymmetric high-k dielectric for reducing gate induced drain leakage |
Arvind Kumar, Chung-Hsun Lin, Shreesh Narasimha, Claude Ortolland, Jonathan T. Shaw |
2017-08-01 |
| 9703301 |
Methods and control systems of resistance adjustment of resistors |
Arvind Kumar, Sungjae Lee |
2017-07-11 |
| 9698159 |
Semiconductor structure with integrated passive structures |
Arvind Kumar, Renee T. Mo, Shreesh Narasimha |
2017-07-04 |
| 9685379 |
Asymmetric high-k dielectric for reducing gate induced drain leakage |
Arvind Kumar, Chung-Hsun Lin, Shreesh Narasimha, Claude Ortolland, Jonathan T. Shaw |
2017-06-20 |
| 9659961 |
Semiconductor structure with integrated passive structures |
Arvind Kumar, Renee T. Mo, Shreesh Narasimha |
2017-05-23 |
| 9627480 |
Junction butting structure using nonuniform trench shape |
Judson R. Holt, Arvind Kumar, Henry K. Utomo |
2017-04-18 |
| 9595518 |
Fin-type metal-semiconductor resistors and fabrication methods thereof |
Chengwen Pei, Edward P. Maciejewski, Ning Zhan |
2017-03-14 |
| 9577061 |
Asymmetric high-K dielectric for reducing gate induced drain leakage |
Arvind Kumar, Chung-Hsun Lin, Shreesh Narasimha, Claude Ortolland, Jonathan T. Shaw |
2017-02-21 |
| 9570354 |
Asymmetric high-K dielectric for reducing gate induced drain leakage |
Arvind Kumar, Chung-Hsun Lin, Shreesh Narasimha, Claude Ortolland, Jonathan T. Shaw |
2017-02-14 |
| 9559010 |
Asymmetric high-k dielectric for reducing gate induced drain leakage |
Arvind Kumar, Chung-Hsun Lin, Shreesh Narasimha, Claude Ortolland, Jonathan T. Shaw |
2017-01-31 |
| 9543213 |
Asymmetric high-k dielectric for reducing gate induced drain leakage |
Arvind Kumar, Chung-Hsun Lin, Shreesh Narasimha, Claude Ortolland, Jonathan T. Shaw |
2017-01-10 |