| 9524986 |
Trapping dislocations in high-mobility fins below isolation layer |
Michael P. Chudzik, Ramachandra Divakaruni, Judson R. Holt, Arvind Kumar |
2016-12-20 |
| 9515164 |
Methods and structure to form high K metal gate stack with single work-function metal |
Takashi Ando, Balaji Kannan, Siddarth A. Krishnan, Shahab Siddiqui |
2016-12-06 |
| 9514992 |
Unidirectional spacer in trench silicide |
Emre Alptekin, Sameer H. Jain, Zhengwen Li, Hari V. Mallela, Ayse M. Ozbek +3 more |
2016-12-06 |
| 9484427 |
Field effect transistors having multiple effective work functions |
Takashi Ando, Min Dai, Balaji Kannan, Siddarth A. Krishnan |
2016-11-01 |
| 9472419 |
Method of patterning dopant films in high-K dielectrics in a soft mask integration scheme |
Takashi Ando, Hemanth Jagannathan, Balaji Kannan, Siddarth A. Krishnan, Rekha Rajaram |
2016-10-18 |
| 9418995 |
Method and structure for transistors using gate stack dopants with minimal nitrogen penetration |
Balaji Kannan, Rekha Rajaram |
2016-08-16 |
| 9397177 |
Variable length multi-channel replacement metal gate including silicon hard mask |
Michael P. Chudzik, Siddarth A. Krishnan |
2016-07-19 |
| 9397175 |
Multi-composition gate dielectric field effect transistors |
Emre Alptekin, Wing L. Lai, Zhengwen Li, Vijay Narayanan, Ravikumar Ramachandran +1 more |
2016-07-19 |
| 9397199 |
Methods of forming multi-Vt III-V TFET devices |
Siddarth A. Krishnan, Vijay Narayanan, Jeffrey W. Sleight |
2016-07-19 |
| 9373690 |
Variable length multi-channel replacement metal gate including silicon hard mask |
Michael P. Chudzik, Siddarth A. Krishnan |
2016-06-21 |
| 9368593 |
Multiple thickness gate dielectrics for replacement gate field effect transistors |
Wing L. Lai, Vijay Narayanan, Sean M. Polvino, Ravikumar Ramachandran, Shahab Siddiqui |
2016-06-14 |
| 9343372 |
Metal stack for reduced gate resistance |
Ruqiang Bao, Rekha Rajaram, Keith Kwong Hon Wong |
2016-05-17 |
| 9330938 |
Method of patterning dopant films in high-k dielectrics in a soft mask integration scheme |
Takashi Ando, Hemanth Jagannathan, Balaji Kannan, Siddarth A. Krishnan, Rekha Rajaram |
2016-05-03 |
| 9318336 |
Non-volatile memory structure employing high-k gate dielectric and metal gate |
Nicolas L. Breil, Michael P. Chudzik, Rishikesh Krishnan, Siddarth A. Krishnan |
2016-04-19 |
| 9293461 |
Replacement metal gate structures for effective work function control |
Michael P. Chudzik, Ravikumar Ramachandran |
2016-03-22 |
| 9231072 |
Multi-composition gate dielectric field effect transistors |
Emre Alptekin, Wing L. Lai, Zhengwen Li, Vijay Narayanan, Ravikumar Ramachandran +1 more |
2016-01-05 |
