DF

Damian Fiolka

CG Carl Zeiss Smt Gmbh: 10 patents #2 of 183Top 2%
AN Asml Holding N.V.: 1 patents #20 of 68Top 30%
AB Asml Netherlands B.V.: 1 patents #144 of 377Top 40%
📍 Oberkochen, DE: #1 of 46 inventorsTop 3%
Overall (2011): #2,415 of 364,097Top 1%
12
Patents 2011

Issued Patents 2011

Showing 1–12 of 12 patents

Patent #TitleCo-InventorsDate
8081293 Illumination system of a microlithographic projection exposure apparatus Nils Dieckmann 2011-12-20
8077289 Device and method for influencing the polarization distribution in an optical system 2011-12-13
8068279 Optical system of an illumination device of a projection exposure apparatus Karl-Heinz Schuster, Juergen Hartmaier, Manfred Maul, Dieter Schmerek, Detlev Mueller +3 more 2011-11-29
8040492 Illumination system of a microlithographic projection exposure apparatus 2011-10-18
8035803 Subsystem of an illumination system of a microlithographic projection exposure apparatus 2011-10-11
8031327 Illumination system of a microlithographic projection exposure apparatus 2011-10-04
8025427 Filter device for the compensation of an asymmetric pupil illumination Manfred Maul 2011-09-27
8004656 Illumination system for a microlithographic projection exposure apparatus Manfred Maul, Vladimir Davydenko, Axel Scholz, Markus Deguenther, Johannes Wangler 2011-08-23
7995280 Projection exposure system, beam delivery system and method of generating a beam of light Matthias Kuss, Gerd Reisinger, Manfred Maul, Vladimir Davydenko 2011-08-09
7940375 Transmission filter apparatus Axel Scholz 2011-05-10
7929116 Polarized radiation in lithographic apparatus and device manufacturing method Christian Wagner, Wilhelmus Petrus De Boeij, Tilmann Heil, Roel De Jonge 2011-04-19
7916391 Apparatus for providing a pattern of polarization Michael Albert 2011-03-29