Issued Patents 2003
Showing 1–8 of 8 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6653027 | Attenuated embedded phase shift photomask blanks | Katherina Babich, Cameron Brooks, S. Jay Chey, C. Richard Guarnieri, Michael S. Hibbs +1 more | 2003-11-25 |
| 6653045 | Radiation sensitive silicon-containing negative resists and use thereof | Ari Aviram, Wu-Song Huang, Ranee W. Kwong, Robert N. Lang, Qinghuang Lin +1 more | 2003-11-25 |
| 6616863 | Plasticized, antiplasticized and crystalline conducting polymers and precursors thereof | Yun-Hsin Liao, Ravi F. Saraf | 2003-09-09 |
| 6617086 | Forming a pattern of a negative photoresist | Edward D. Babich, Inna V. Babich, Katherina Babich, James J. Bucchignano, Karen E. Petrillo +1 more | 2003-09-09 |
| 6586156 | Etch improved resist systems containing acrylate (or methacrylate) silane monomers | Wu-Song Huang, Dai Junyan, Ranee W. Kwong, Robert N. Lang, Arpan Mahorowala +3 more | 2003-07-01 |
| 6543617 | Packaged radiation sensitive coated workpiece process for making and method of storing same | Wu-Song Huang, Ranee W. Kwong, David R. Medeiros, Wayne M. Moreau, Karen E. Petrillo +2 more | 2003-04-08 |
| 6514667 | Tunable vapor deposited materials as antireflective coatings, hardmasks and as combined antireflective coating/hardmasks and methods of fabrication thereof and applications thereof | Katherina Babich, Alfred Grill, Scott D. Halle, Arpan Mahorowala, Vishnubhai V. Patel | 2003-02-04 |
| 6503692 | Antireflective silicon-containing compositions as hardmask layer | Ari Aviram, C. Richard Guarnieri, Wu-Song Huang, Ranee W. Kwong, Wayne M. Moreau | 2003-01-07 |