Issued Patents 2003
Showing 1–6 of 6 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6669858 | Integrated low k dielectrics and etch stops | Claes Bjorkman, Min Melissa Yu, Hongquing Shan, David Cheung, Wai-Fan Yau +7 more | 2003-12-30 |
| 6613691 | Highly selective oxide etch process using hexafluorobutadiene | Raymond Hung, Joseph P. Caulfield, Hongching Shan, Ruiping Wang | 2003-09-02 |
| 6602434 | Process for etching oxide using hexafluorobutadiene or related fluorocarbons and manifesting a wide process window | Hoiman Hung, Joseph P. Caulfield, Hongqing Shan, Ruiping Wang | 2003-08-05 |
| 6528751 | Plasma reactor with overhead RF electrode tuned to the plasma | Daniel J. Hoffman | 2003-03-04 |
| 6518195 | Plasma reactor using inductive RF coupling, and processes | Kenneth S. Collins, Chan-Lon Yang, Jerry Wong, Jeffrey Marks, Peter Keswick +7 more | 2003-02-11 |
| 6503367 | Magnetically enhanced inductively coupled plasma reactor with magnetically confined plasma | Peter Loewenhardt, Philip M. Salzman | 2003-01-07 |