Issued Patents 2002
Showing 1–6 of 6 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6482746 | Computer readable medium for controlling a method of cleaning a process chamber | Anand Vasudev, Toshio Itoh, Ramamujapuram A. Srinivas, Frederick Wu, Li Wu +1 more | 2002-11-19 |
| 6432479 | Method for in-situ, post deposition surface passivation of a chemical vapor deposited film | Ramanujapuram A. Srinivas, Li Wu | 2002-08-13 |
| 6402806 | Method for unreacted precursor conversion and effluent removal | John V. Schmitt, Ling Chen, George Michael Bleyle, Yu D. Cong, Alfred Mak | 2002-06-11 |
| 6395128 | RF powered plasma enhanced chemical vapor deposition reactor and methods of effecting plasma enhanced chemical vapor deposition | Sujit Sharan, Gurtej S. Sandhu, Paul Smith | 2002-05-28 |
| 6365495 | Method for performing metallo-organic chemical vapor deposition of titanium nitride at reduced temperature | Shulin Wang, Huan Luo, Keith Kuang-Kuo Koai, Ming Xi, Russell C. Ellwanger | 2002-04-02 |
| 6355106 | Deposition of copper with increased adhesion | Bo Zheng, Ling Chen, Alfred Mak | 2002-03-12 |