Issued Patents 2002
Showing 1–17 of 17 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6499425 | Quasi-remote plasma processing method and apparatus | Gurtej S. Sandhu, Anand Srinivasan | 2002-12-31 |
| 6488571 | Apparatus for enhanced rate chemical mechanical polishing with adjustable selectivity | — | 2002-12-03 |
| 6472756 | Method of forming titanium silicide and titanium by chemical vapor deposition and resulting apparatus | Trung T. Doan, Gurtej S. Sandhu, Kirk D. Prall | 2002-10-29 |
| 6468925 | Plasma enhanced chemical vapor deposition process | Philip Campbell, Craig M. Carpenter, Allen Mardian | 2002-10-22 |
| 6444556 | Chemistry for chemical vapor deposition of titanium containing films | Howard E. Rhodes, Philip J. Ireland, Gurtej S. Sandhu | 2002-09-03 |
| 6433430 | Contact structure having a diffusion barrier | Varatharajan Nagabushnam | 2002-08-13 |
| 6429071 | Method of increasing capacitance of memory cells incorporating hemispherical grained silicon | Thomas A. Figura, Anand Srinivasan, Gurtej S. Sandhu | 2002-08-06 |
| 6423626 | Removal of metal cusp for improved contact fill | Anand Srinivasan, Gurtej S. Sandhu | 2002-07-23 |
| 6412437 | Plasma enhanced chemical vapor deposition reactor and plasma enhanced chemical vapor deposition process | Philip Campbell, Craig M. Carpenter, Allen Mardian | 2002-07-02 |
| 6398923 | Multiple species sputtering method | P. J. Ireland, Howard E. Rhodes, Sukesh Sandhu, Tim O'Brien, Tim Johnson | 2002-06-04 |
| 6395128 | RF powered plasma enhanced chemical vapor deposition reactor and methods of effecting plasma enhanced chemical vapor deposition | Gurtej S. Sandhu, Paul Smith, Mei Chang | 2002-05-28 |
| 6388284 | Capacitor structures | Howard E. Rhodes, Lyle Breiner, Philip J. Ireland, Trung T. Doan, Gurtej S. Sandhu | 2002-05-14 |
| 6368988 | Combined gate cap or digit line and spacer deposition using HDP | Weimin Li, Gurtej S. Sandhu | 2002-04-09 |
| 6362088 | Method of forming ohmic conductive components in a single chamber process | Gurtej S. Sandhu | 2002-03-26 |
| 6340499 | Method to increase gas residence time in a reactor | Gurtej S. Sandhu, Ravi Iyer | 2002-01-22 |
| 6340637 | Chemical vapor deposition of titanium from titanium tetrachloride and hydrocarbon reactants | Ravi Iyer | 2002-01-22 |
| 6335282 | Method of forming a titanium comprising layer and method of forming a conductive silicide contact | Gurtej S. Sandhu | 2002-01-01 |