Issued Patents 2002
Showing 1–17 of 17 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6501179 | Constructions comprising insulative materials | Werner Juengling, Kirk D. Prall, Gurtej S. Sandhu, Guy T. Blalock | 2002-12-31 |
| 6498109 | System and method for plasma etching | — | 2002-12-24 |
| 6495450 | Isolation using an antireflective coating | Steven M. McDonald, Thomas R. Glass, Zhiping Yin | 2002-12-17 |
| 6462394 | Device configured to avoid threshold voltage shift in a dielectric film | Randhir P. S. Thakur, Howard E. Rhodes | 2002-10-08 |
| 6461950 | Semiconductor processing methods, semiconductor circuitry, and gate stacks | Zhiping Yin, Thomas R. Glass, Richard Holscher, Ardavan Niroomand, Linda K. Somerville +1 more | 2002-10-08 |
| 6458721 | Method for improving thickness uniformity of deposited ozone-TEOS silicate glass layers | — | 2002-10-01 |
| 6455394 | Method for trench isolation by selective deposition of low temperature oxide films | Gurtej S. Sandhu, Pai-Hung Pan | 2002-09-24 |
| 6441466 | Method and apparatus for reducing fixed charge in semiconductor device layers | Randhir P. S. Thakur, Howard E. Rhodes | 2002-08-27 |
| 6432813 | Semiconductor processing method of forming insulative material over conductive lines | Gurtej S. Sandhu | 2002-08-13 |
| 6423631 | Isolation using an antireflective coating | Steven M. McDonald, Thomas R. Glass, Zhiping Yin | 2002-07-23 |
| 6410984 | Conductive structure in an integrated circuit | Jigish Trivedi | 2002-06-25 |
| 6383723 | Method to clean substrate and improve photoresist profile | Ardavan Niroomand | 2002-05-07 |
| 6372669 | Method of depositing silicon oxides | Gurtej S. Sandhu | 2002-04-16 |
| 6365530 | Techniques for improving adhesion of silicon dioxide to titanium | — | 2002-04-02 |
| 6340499 | Method to increase gas residence time in a reactor | Gurtej S. Sandhu, Sujit Sharan | 2002-01-22 |
| 6340637 | Chemical vapor deposition of titanium from titanium tetrachloride and hydrocarbon reactants | Sujit Sharan | 2002-01-22 |
| 6337286 | Method for etching metals using organohalide compounds | — | 2002-01-08 |