Issued Patents 2002
Showing 1–4 of 4 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6479884 | Interim oxidation of silsesquioxane dielectric for dual damascene process | Robert Cook, John P. Hummel, Joyce C. Liu, Vincent J. McGahay, Rebecca D. Mih +1 more | 2002-11-12 |
| 6451712 | Method for forming a porous dielectric material layer in a semiconductor device and device formed | Timothy J. Dalton, Jeffrey Hedrick, Satyanarayana V. Nitta, Sampath Purushothaman, Kenneth P. Rodbell +1 more | 2002-09-17 |
| 6348736 | In situ formation of protective layer on silsesquioxane dielectric for dual damascene process | Vincent J. McGahay, John P. Hummel, Joyce C. Liu, Rebecca D. Mih, Kamalesh K. Srivastava +1 more | 2002-02-19 |
| 6339022 | Method of annealing copper metallurgy | Arne Ballantine, Edward C. Cooney, III, George A. Dunbar, III, Cheryl G. Faltermeier, Jeffrey D. Gilbert +9 more | 2002-01-15 |