| 12452521 |
Providing a template for media content generation |
Matthew Dominick Mahar, Vineet Kapil, Kaveh Anvaripour, Ranidu Lankage, Anton Shevchenko +5 more |
2025-10-21 |
|
| 8229062 |
Transmission mask with differential attenuation to improve ISO-dense proximity |
Hang Yip Liu, Sebastian Schmidt |
2012-07-24 |
$922,000 |
| 7807342 |
Transmission mask with differential attenuation to improve ISO-dense proximity |
Hang Yip Liu, Sebastian Schmidt |
2010-10-05 |
|
| 7633601 |
Method and related operation system for immersion lithography |
Yong Huang, Chun-Chi Yu, Huan-Ting Tseng, Bo-Jou Lu |
2009-12-15 |
$4,653,000 |
| 7476472 |
Method for designing photomask |
Ming-Feng Shieh, Chun-Chi Yu, Jian-Shin Liou |
2009-01-13 |
$4,426,000 |
| 7268070 |
Profile improvement method for patterning |
Hui Huang, Cheng-Chung Chen, George Liu |
2007-09-11 |
$2,364,000 |
| 7105255 |
EUV reflection mask and lithographic process using the same |
— |
2006-09-12 |
$810,000 |
| 7074528 |
Effective assist pattern for nested and isolated contacts |
Jochen Schacht, Uwe Schroeder |
2006-07-11 |
$174,000 |
| 7052808 |
Transmission mask with differential attenuation to improve ISO-dense proximity |
Hang Yip Liu, Sebastian Schmidt |
2006-05-30 |
|
| 7018788 |
Phase shifting lithographic process |
— |
2006-03-28 |
$1,011,000 |
| 6866967 |
Structure of phase shifting mask |
— |
2005-03-15 |
$6,866,000 |
| 6849393 |
Phase shifting lithographic process |
— |
2005-02-01 |
$1,410,000 |
| 6844143 |
Sandwich photoresist structure in photolithographic process |
Vencent Chang, George Liu, Cheng-Chung Chen |
2005-01-18 |
$1,200,000 |
| 6740473 |
Method for shrinking critical dimension of semiconductor devices |
Hui Huang |
2004-05-25 |
$4,503,000 |
| 6534412 |
Method for removing native oxide |
— |
2003-03-18 |
$1,528,000 |
| 6511891 |
Method of preventing toppling of lower electrode through flush cleaning |
Nathna Sun, Chuan-Fu Wang |
2003-01-28 |
$1,359,000 |
| 6348287 |
Multiphase phase shifting mask |
— |
2002-02-19 |
$2,915,000 |
| 6296974 |
Method of forming a multi-layer photo mask |
— |
2001-10-02 |
|
| 6296991 |
Bi-focus exposure process |
— |
2001-10-02 |
$470,000 |
| 6296987 |
Method for forming different patterns using one mask |
Chien-Li Kuo |
2001-10-02 |
$470,000 |
| 6291338 |
Method of fabricating self-aligned polysilicon via plug |
Jhy-Jyi Sze |
2001-09-18 |
$488,000 |
| 6277685 |
Method of forming a node contact hole on a semiconductor wafer |
Jung-Chao Chiou, Chin-Hui Lee, Chuan-Fu Wang |
2001-08-21 |
$721,000 |
| 6238825 |
Mask with alternating scattering bars |
— |
2001-05-29 |
$770,000 |
| 6211875 |
Display template setting method in a multimedia synchronous training system |
Ming-Shing Su, Chung-Chih Lin, Chien-Hung Yang |
2001-04-03 |
|
| 6211868 |
Editing method in a multimedia synchronous training system |
Ming-Shing Su, Chung-Chih Lin, Chien-Hung Yang |
2001-04-03 |
|
