Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Effective assist pattern for nested and isolated contacts

Effective assist pattern for nested and isolated contacts

US Patent 7074528 · Granted Jul 11, 2006

Estimated economic value: $174,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Providing a template for media content generation2025
Three-dimensional pattern risk scoring2019
Method of forming a gate contact structure and source/drain contact structure fo2019
Multi-stage pattern recognition in circuit designs2019
Feed-forward for silicon inspections (DFM2CFM : design to silicon) and feed-back2018
Method, system and program product for identifying anomalies in integrated circu2018
Methods, apparatus, and system for using filler cells in design of integrated ci2017
Capacitors including amorphous dielectric layers and methods of forming the same2016
Methods, apparatus and system for reduction of power consumption in a semiconduc2016
Lithography masks, systems, and manufacturing methods2015
SRAM memory cell having a dogleg shaped gate electrode structure2014
Lithography masks, systems, and manufacturing methods2014