KM

Ken Miyagi

TC Tokyo Ohka Kogyo Co.: 35 patents #22 of 684Top 4%
Canon: 17 patents #3,927 of 19,416Top 25%
RI Riken: 6 patents #103 of 1,824Top 6%
TC The University Of Chicago: 3 patents #172 of 1,377Top 15%
NU National University Corporation Hokkaido University: 2 patents #130 of 825Top 20%
TT Tokyo Institute Of Technology: 2 patents #232 of 1,159Top 25%
📍 Kawasaki, TX: #2 of 14 inventorsTop 15%
Overall (All Time): #47,460 of 4,157,543Top 2%
54
Patents All Time

Issued Patents All Time

Showing 26–50 of 54 patents

Patent #TitleCo-InventorsDate
8293392 Battery holder for a battery array, and battery array Junyoung Park 2012-10-23
8163836 Adhesive composition and adhesive film Koichi Misumi, Atsushi Miyanari, Yoshihiro Inao 2012-04-24
7358028 Chemically amplified positive photo resist composition and method for forming resist pattern Kenji Maruyama, Masaki Kurihara, Satoshi Niikura, Satoshi Shimatani, Masahiro Masujima +3 more 2008-04-15
7268061 Substrate attaching method Atsushi Miyanari, Kosuke Doi, Yoshihiro Inao, Koichi Misumi 2007-09-11
6939926 Phenol novolak resin, production process thereof, and positive photoresist composition using the same Yasuhide Ohuchi, Atsuko Hirata, Kousuke Doi, Hidekatsu Kohara, Toshimasa Nakayama 2005-09-06
6730769 Novolak resin, production process thereof and positive photoresist composition using the novolak resin Akira Katano, Mitsuo Hagihara, Toshiaki Tachi 2004-05-04
6620978 Positive photoresist composition and process for synthesizing polyphenol compound Satoshi Shimatani, Satoshi Niikura, Hidekatsu Kohara, Toshimasa Nakayama 2003-09-16
6492085 Positive photoresist composition and process and synthesizing polyphenol compound Satoshi Shimatani, Satoshi Niikura, Hidekatsu Kohara, Toshimasa Nakayama 2002-12-10
6475694 Positive photoresist composition comprising a phenolic compound having both an acid-decomposable group and a naphthoquinonediazide sulfonyl group Kousuke Doi, Atsuko Hirata, Hidekatsu Kohara, Toshimasa Nakayama 2002-11-05
6417317 Novolak resin precursor, novolak resin and positive photoresist composition containing the novolak resin Kousuke Doi, Ryuusaku Takahashi, Hidekatsu Kohara, Toshimasa Nakayama 2002-07-09
6207788 Novolak resin precursor, novolak resin and positive photoresist composition containing the novolak resin Kousuke Doi, Ryuusaku Takahashi, Hidekatsu Kohara, Toshimasa Nakayama 2001-03-27
6187500 Positive photoresist compositions and multilayer resist materials using same Kousuke Doi, Atsuko Hirata, Hidekatsu Kohara, Toshimasa Nakayama 2001-02-13
5864407 Image processing system Katsuichi Shimizu, Takehiko Shibata, Yoshikazu Yokomizo, Akira Suzuki, Koichi Murakami +3 more 1999-01-26
5115256 Beam recorder with scan position control Hiroyuki Miyake 1992-05-19
5008760 Image processing system Katsuichi Shimizu, Takehiko Shibata, Yoshikazu Yokomizo, Akira Suzuki, Koichi Murakami +3 more 1991-04-16
4912491 Apparatus for forming superimposed images Osamu Hoshino, Hideaki Mitsutake, Yasushi Murayama, Kazuyoshi Chiku, Yukio Sato +2 more 1990-03-27
4903067 Multiimage forming apparatus Yasushi Murayama, Osamu Hoshino, Kazuyoshi Chiku, Yukio Sato, Yoichi Kubota +6 more 1990-02-20
4829217 Device for controlling movement of a rotating element Toru Kameyama 1989-05-09
4819066 Image processing apparatus 1989-04-04
4811109 Image processing system Katsuichi Shimizu, Takehiko Shibata, Yoshikazu Yokomizo, Akira Suzuki, Koichi Murakami +3 more 1989-03-07
4739230 Control device for controlling motor speed without hunting Hiraku Sonobe 1988-04-19
4731657 Control apparatus 1988-03-15
4641197 Image processing method or apparatus 1987-02-03
4641199 Image reading apparatus 1987-02-03
4635129 Image scanning apparatus 1987-01-06