SM

Shigehiro Miura

TL Tokyo Electron Limited: 37 patents #85 of 5,567Top 2%
PA Panasonic: 2 patents #9,678 of 21,108Top 50%
Overall (All Time): #82,528 of 4,157,543Top 2%
39
Patents All Time

Issued Patents All Time

Showing 26–39 of 39 patents

Patent #TitleCo-InventorsDate
9711370 Substrate processing apparatus and method of processing a substrate Hitoshi Kato, Jun Sato, Hiroyuki Kikuchi 2017-07-18
9693434 Dimming device and illumination system using same Kei Miura, Kiyoshi Gotou, Takeo Suzuki 2017-06-27
9607828 Method of depositing a silicon-containing film Jun Sato 2017-03-28
9601318 Plasma processing method and plasma processing apparatus Hitoshi Kato, Jun Sato, Toshiyuki Nakatsubo, Hiroyuki Kikuchi 2017-03-21
9583318 Plasma processing apparatus, plasma processing method, and recording medium Takeshi Kobayashi, Katsuaki Sugawara, Naohide Ito 2017-02-28
9583312 Film formation device, substrate processing device, and film formation method Jun Yamawaku, Chishio Koshimizu, Yohei Yamazawa, Mitsuhiro Tachibana, Hitoshi Kato +2 more 2017-02-28
9502215 Plasma processing apparatus and plasma processing method Hitoshi Kato, Chishio Koshimizu, Jun Yamawaku, Yohei Yamazawa 2016-11-22
9466483 Film deposition apparatus and film deposition method Hitoshi Kato 2016-10-11
9376751 Plasma processing device and operation method Hitoshi Kato, Jun Sato, Takeshi Kobayashi, Masato Yonezawa 2016-06-28
9209011 Method of operating film deposition apparatus and film deposition apparatus Hitoshi Kato 2015-12-08
9129518 Device control system, wireless control apparatus, and computer readable recording medium Tomoaki Sasaki, Taku Haraguchi 2015-09-08
9111747 Film deposition apparatus, substrate processing apparatus and film deposition method Jun Yamawaku, Chishio Koshimizu, Mitsuhiro Tachibana, Hitoshi Kato, Takeshi Kobayashi +1 more 2015-08-18
8927440 Film deposition apparatus and method of depositing film Hitoshi Kato 2015-01-06
8871654 Film deposition apparatus, and method of depositing a film Hitoshi Kato 2014-10-28