Issued Patents All Time
Showing 26–46 of 46 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8964350 | Substrate removing method and storage medium | Yohei Yamazawa | 2015-02-24 |
| 8858753 | Focus ring heating method, plasma etching apparatus, and plasma etching method | Chishio Koshimizu, Tatsuo Matsudo, Masashi Saito | 2014-10-14 |
| 8845853 | Substrate processing apparatus and substrate processing method | Tsuyoshi Moriya | 2014-09-30 |
| 8824875 | Method for heating part in processing chamber of semiconductor manufacturing apparatus and semiconductor manufacturing apparatus | Chishio Koshimizu, Tatsuo Matsudo | 2014-09-02 |
| 8825434 | Temperature measuring method, storage medium, and program | Chishio Koshimizu, Tatsuo Matsudo | 2014-09-02 |
| 8777483 | Temperature measuring apparatus and temperature measuring method | Chishio Koshimizu, Tatsuo Matsudo, Kenji Nagai | 2014-07-15 |
| 8741097 | Plasma processing apparatus and plasma processing method | Yohei Yamazawa, Chishio Koshimizu, Masashi Saito, Kazuki Denpoh | 2014-06-03 |
| 8608903 | Plasma processing apparatus and plasma processing method | Yohei Yamazawa, Chishio Koshimizu, Masashi Saito, Kazuki Denpoh, Hachishiro Iizuka | 2013-12-17 |
| 8593780 | Substrate removing method and storage medium | Yohei Yamazawa | 2013-11-26 |
| 8585831 | Substrate cleaning method | Hidefumi Matsui, Tsuyoshi Moriya, Eiichi Nishimura, Shinichi Kawaguchi, Kunio Miyauchi | 2013-11-19 |
| 8523428 | Component in processing chamber of substrate processing apparatus and method of measuring temperature of the component | Chishio Koshimizu, Tatsuo Matsudo | 2013-09-03 |
| 8516715 | Evacuation method and storage medium | Tsuyoshi Moriya, Hideaki Yakushiji, Kazumasa Abe | 2013-08-27 |
| 8486221 | Focus ring heating method, plasma etching apparatus, and plasma etching method | Chishio Koshimizu, Tatsuo Matsudo, Masashi Saito | 2013-07-16 |
| 8409328 | Substrate transfer device and substrate transfer method | Junji Oikawa, Hiroyuki Nakayama | 2013-04-02 |
| 8398745 | Substrate processing apparatus and exhaust method therefor | Junji Oikawa, Hiroyuki Nakayama | 2013-03-19 |
| 8384902 | Optical gas-analysis system and a gas flow cell | Osamu Akiyama, Tsuyoshi Moriya | 2013-02-26 |
| 8297292 | Cleaning device and cleaning method of semiconductor manufacturing apparatus | Takayuki Kokubo, Tsuyoshi Moriya | 2012-10-30 |
| 8257498 | Substrate transfer module and substrate processing system | Tsuyoshi Moriya | 2012-09-04 |
| 8253930 | Absorption spectrometric apparatus for semiconductor production process | Osamu Akiyama, Masashi Akimoto, Tsuyoshi Moriya | 2012-08-28 |
| 8052376 | Turbo-molecular pump, substrate processing apparatus, and method for suppressing attachment of depositions to turbo-molecular pump | Tsuyoshi Moriya | 2011-11-08 |
| 8034720 | Substrate processing method and substrate processing apparatus | Eiichi Nishimura, Chie Kato | 2011-10-11 |