JO

Jun Ookura

TL Tokyo Electron Limited: 15 patents #423 of 5,567Top 8%
Overall (All Time): #325,443 of 4,157,543Top 8%
15
Patents All Time

Issued Patents All Time

Showing 1–15 of 15 patents

Patent #TitleCo-InventorsDate
7868270 Temperature control for performing heat process in coating/developing system for resist film Eiichi Sekimoto, Hisakazu Nakayama 2011-01-11
7755003 Temperature control for performing heat process on resist film Eiichi Sekimoto, Hisakazu Nakayama 2010-07-13
7510611 Coating film forming method and apparatus Tomohide Minami, Shinichi Sugimoto, Takahiro Kitano, Hiroaki Kurishima 2009-03-31
7488505 Coating film forming method and system Tomohide Minami, Shinichi Sugimoto, Takahiro Kitano, Hiroaki Kurishima 2009-02-10
6973370 Substrate processing apparatus and method for adjusting a substrate transfer position Kazuhiko Ito, Kazutoshi Ishimaru, Michio Kinoshita, Yuichi Douki 2005-12-06
6884294 Coating film forming method and apparatus Tomohide Minami, Shinichi Sugimoto, Takahiro Kitano, Hiroaki Kurishima 2005-04-26
6776845 Coating film forming method and system Tomohide Minami, Shinichi Sugimoto, Takahiro Kitano, Hiroaki Kurishima 2004-08-17
6686571 Heat treatment unit, cooling unit and cooling treatment method Koji Harada 2004-02-03
6654668 Processing apparatus, processing system, distinguishing method, and detecting method Koji Harada, Hisakazu Nakayama 2003-11-25
6644965 Substrate processing apparatus and substrate processing method Koji Harada 2003-11-11
6620245 Liquid coating apparatus with temperature controlling manifold Seiki Ishida, Junichi Iwano, Michishige Saito 2003-09-16
6507770 Substrate processing system and substrate processing method Masanori Tateyama, Kenichi Okubo 2003-01-14
6461438 Heat treatment unit, cooling unit and cooling treatment method Koji Harada 2002-10-08
6402509 Substrate processing apparatus and substrate processing method Koji Harada 2002-06-11
6332751 Transfer device centering method and substrate processing apparatus Seiji Kozawa, Naruaki Iida 2001-12-25