Issued Patents All Time
Showing 1–9 of 9 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12087813 | Deep trench isolation with field oxide | Abbas Ali, Rajni J. Aggarwal, Steven J. Adler | 2024-09-10 |
| 11742208 | Method of reducing voids and seams in trench structures by forming semi-amorphous polysilicon | Damien Thomas Gilmore, Jonathan Philip Davis, Azghar H Khazi-Syed, Shariq Arshad, Khanh Quang Le +3 more | 2023-08-29 |
| 11081558 | LDMOS with high-k drain STI dielectric | Umamaheswari Aghoram, Pushpa Mahalingam, Alexei Sadovnikov | 2021-08-03 |
| 10593773 | LDMOS with high-k drain STI dielectric | Umamaheswari Aghoram, Pushpa Mahalingam, Alexei Sadovnikov | 2020-03-17 |
| 8334190 | Single step CMP for polishing three or more layer film stacks | Binghua Hu, Sopa Chevacharoenkul, Prakash Dalpatbhai Dev | 2012-12-18 |
| 8172647 | Polish pad conditioning in mechanical polishing systems | Gul B. Basim | 2012-05-08 |
| 7899571 | Predictive method to improve within wafer CMP uniformity through optimized pad conditioning | Gul B. Basim, Serkan Kincal | 2011-03-01 |
| 6120350 | Process for reconditioning polishing pads | Yi Zhou | 2000-09-19 |
| 5424224 | Method of surface protection of a semiconductor wafer during polishing | Franklin L. Allen, Lawrence D. Dyer, Jerry B. Medders, Vikki S. Simpson, Jerry D. Smith +2 more | 1995-06-13 |